摘要
模具是纳米压印光刻(Nanoimprint lithography,NIL)与传统光学光刻工艺最大的区别所在,模具作为压印特征的初始载体直接决定着压印图型的质量,要实现高质量的压印复型,必须要有高质量的压印模具。不同于传统光学光刻使用的掩模(4X),纳米压印光刻使用的是1X模版,它在模具制作、检查和修复技术面临更大挑战。当前,模具的制作已经成为NIL最大的技术瓶颈,而且随着纳米压印光刻研究的日益深入以及应用领域的不断扩大,NIL模具的制造将变的越来越重要并面临着更加严峻的挑战。因此,模具的制造已经成为当前纳米压印光刻一个最重要的研究热点,纳米压印光刻发展的历史也是压印模具不断发展创新的历史。综述了当前国内外各种纳米压印光刻模具制作技术研究进展,并指出三维模具、大面积模具和高分辨率模具的制作、模具缺陷的检查和修复是当前及其将来最迫切的需求、最主要的研究热点和挑战。
Nanoimprint lithography （NIL） is attracting attention as a low-cost and high-throughput method for printing nanometer-scale geometries, and has been included on the ITRS lithography roadmap at the 32 and 22 nm nodes. The template making is one of the most critical issues for the realization of NIL. The ultimate resolution of the patterns fabricated by NIL is primarily determined by the resolution of the features on the surface of the mold. Because of the 1X nature of NIL compared with 4X for photolithography, the 1X template fabrication is considered as the greatest challenge for NIL. Advances in NIL template fabrication processes are reviewed. The fabrication methods of 3D, large area and high resolution templates are currently critical requirements and challenges. As a result, new mold making methods should be further developed to meet the requirements from emerging market applications such as patterned media, photonie crystals and wire grid polarizers.
出处
《机械工程学报》
EI
CAS
CSCD
北大核心
2009年第6期1-13,共13页
Journal of Mechanical Engineering
基金
国家重点基础研究发展计划(973计划,2009CB724202)
国家高技术研究发展计划(863计划,2006AA04Z322)
山东省自然科学基金(Y2007F49)资助项目
关键词
纳米压印光刻
模具制作
三维模具
大面积模具
软模具
Nanoimprint lithography Template fabrication 3D template Large area template Soft mold
