摘要
等离子体浸没式离子注入沉积是近年来迅速发展的一种材料表面改性新技术,其基本原理是,作为靶的工件外表面全部浸没在低气压、高密度的均匀等离子体中,工件上施加频率为数百赫兹、数千至数万伏高压负脉冲偏压。它克服了传统方法所具有的薄膜沉积或离子注入存在方向性的固有缺陷,因此在复杂形状的三维工件表面改性工艺与技术上表现出无与伦比的优越性。该技术可以有多种工作模式,在离子注入前、注入期间或注入后进行原位清洗、刻蚀或薄膜沉积。作为应用实例,本文给出在复杂形状构件上合成均匀类金刚石或纳米金刚石薄膜的实验结果,最后指出等离子体浸没式离子注入沉积技术的发展趋势和工业化应用尚需解决的问题。
The latest progress of plasma immersion ion implantation and deposition （PⅢ＆ D） as well as its applications in surface modification was tentative reviewed. Discussion focuses on its operating principle, its defferent working modes, its many advantages over the conventional techniques strengths, especially for the substrates with complicated 3-dimensional surface geometry. To exemplify the PⅢ＆D technique, high quality diamond-like carbon films or diamond nanoparticle films were grown on the steel ball substrate by using a planar inductively coupled plasma source and RF bias power supply. In addition, the weakness of the PⅢ＆D technique, its development trend and its technical problems to be solved in industial applications were also discussed.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2009年第3期255-263,共9页
Chinese Journal of Vacuum Science and Technology
基金
高等学校科技创新工程重大项目(No.707015)
关键词
等离子体浸没技术
表面改性
三维复杂构件
类金刚石薄膜
纳米金刚石薄膜
Plasma immersion techniques, Surface modification, 3D complex-shape workpieces, Diamond-like carbon films, Nano-crystalline diamond films
