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三氧化钨晶化薄膜的制备及微观结构研究

On preparation of WO_3 crystal film and its microstructure
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摘要 研究了三氧化钨(WO3)晶化薄膜表面分子结构的AFM表征及X射线衍射谱.结果发现,WO3溶胶掺铂薄膜经460℃热处理后晶化,元胞为正六面体,内含1个WO6八面体,氧离子位居6个面心,钨离子处在体心,晶格常数为(0.75±0.05)nm,自然生长面为002面,在002面上的元胞中有5个离子,4个氧离子位居四边形的顶点,钨离子处于中心,氧离子的间距为(0.55±0.05)nm. The molecular structure of the surface of WO3 crystal film is studied by AFM and XRD spectrums. The results show that the sol-gel WO3 film doped with Pt is crystallized after annealing at 460℃. Its structure cell is a cube and includes a WO6 octahedron in which six oxygen ions locate in the center of six planes of the cube and one tungsten ion locates in the center of the cube. Its lattice parameter is (0. 75±0.05) nm, and its natural growth surface is (002) on which one cell includes five ions, four oxygen ions locate in the vertexes of the quadrangle and one tungsten ion locates in the center of the quadrangle, the distance between two adjacent oxygen ions is (0.55±0.05) nm.
出处 《天津师范大学学报(自然科学版)》 CAS 北大核心 2009年第2期35-37,共3页 Journal of Tianjin Normal University:Natural Science Edition
基金 天津师范大学校青年教育基金项目(52LJ75)
关键词 AFM 三氧化钨晶化薄膜 X射线衍射谱 分子结构 AFM WO3 crystal film XRD spectrum molecular structure
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