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激光作用下硅靶材的等离子体光谱强度分析 被引量:1

Spectral intensity analysis on silicon induced by laser
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摘要 建立一套激光等离子体光谱测量实验装置,以Nd∶YAG调Q倍频固体激光器为激发光源,硅作为样品.获得了不同激光能量时的硅样品原子辐射谱图,从中提取硅在634 nm处的等离子体谱,分析等离子体谱强度的变化趋势,得到的实验结果与理论分析符合的很好. To build up a set of laser plasma spectra measurement setup, selects Nd: YAG double - frequency solid state laser as pumping laser and silicon is sample. Through modulating the energy of laser to obtain atom-emission spectra of silicon sample, among which abstract the plasma at 634 nm and analyze the varying tendency of plasma spectra intensity. The results show that the experiment value and theory value are in an excellent agreement.
出处 《哈尔滨商业大学学报(自然科学版)》 CAS 2009年第2期240-241,245,共3页 Journal of Harbin University of Commerce:Natural Sciences Edition
基金 吉林省杰出青年基金项目(20040517)
关键词 激光等离子体 光谱 激光烧蚀 laser plasma spectra laser ablate
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