摘要
针对二极式场致发射显示器(field emission display,FED)驱动电压过高的问题,没计制作了前栅极式三极结构纳米ZnO场致发射显示器,并进行了场致发射实验,验证这种结构的可行性。前栅极结构采用喷砂工艺结合光刻技术,制作出微细的栅孔结构,实现丫较低电压的控制。同时对影响场致发射性能的栅极电压、栅孔开口尺寸和介质层厚度进行了分析讨论。实验结果表明:采用三极结构四针状纳米ZnO场致发射显示器具有良好的发射性能,是一种有前途的场致发射显示器。
The diode field emission display （FED） has high driving voltage, which brings trouble to driving circuit. In order to solve this problem, we design normal grid triode structure tetrapod-like nano-ZnO FED. The field emission property is investigated. The results show that the structure is feasible. With abrasive blasting and lithographic technology, grid apertures of the normal grid structure have been created, and low voltage control is achieved. The grid voltage, the gate apertures size and the thickness of medium layer parameters which influence the performance of triode FED have been analyzed. The experimental results show that normal gate triode-structure tetrapod-like nano-ZnO FED has well electron emission performance and it is also a potential field emission display.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2009年第2期500-505,共6页
Acta Optica Sinica
基金
国家863计划(2005AA303G10)
福建省科技重大专项(2004HZ01-2)
福建省科技三项经费(2006F5061)资助项目
关键词
光电子学
场致发射
四针状氧化锌
三极结构
发射性能
optoelectronics
field emission
tetrapod-like ZnO
triode structures
emission performance
