摘要
光刻仿真是SOC(System On Chip)光刻工艺的重要环节,为了实现仿真数据3D可视化,在光刻仿真程序SPLAT(Simulation of Projection Lens Aberrations via TCCs)基础上,提出了自动排序算法对SPLAT输出数据进行重新排列以便三维建模,建立了光照强度与深度转换模型,将光照强度数值转变为3D可视化的深度数据,论文最后设计了3D实时图形仿真程序并进行了实验。实验证明了自动排序算法以及转换模型的正确性和先进性,为超大规模SOC数据的3D交互式实时显示奠定了基础。
Photolithography simulation is the key process of SOC （System on Chip） photolithography fabrication. Based on SPLAT （Simulation of Projection Lens Aberrations via TCCs）, an automatic sorting algorithm designed for 3D modeling was introduced in order to re-sort the simulation data of SPLAT output file. In addition, a transformation model that converted light intensity data into deep data was proposed. The light intensity data of SPLAT output file was converted into data with 3D visualization using the transformation model. Experimental results show that both the automatic sorting algorithm and the transformation model are applicable and novel. Besides, the model and algorithm proposed can be further applied to large-scale interactive real-time 3D visualization for SOC data simulation.
出处
《系统仿真学报》
EI
CAS
CSCD
北大核心
2008年第23期6383-6386,共4页
Journal of System Simulation
基金
国家863高技术研究发展计划(2007AA01Z319)
国家自然科学基金(60873130)
上海市重点学科建设项目(J50104)
上海大学研究生创新基金(06820113)
