摘要
ＩＴＯ膜主要受溅射过程中溅射参数的影响．本文分析和验证真空和大气退火也改善和提高ＩＴＯ的特性，根据我们的实验条件，本文主要研究退火工艺对ＩＴＯ膜的面电阻、可见光透过率、热稳定性及晶向结构等特性的影响．
The properties of ITO films are strongly effected by sputtering parameters.In this paper,it is found that air or vacuum annealing could improve or enhance characteristics of ITO films.According to experimental conditions,we only focus our attention on effect of postannealing on the conductivity、transparency、thermal stability and crystal structivity of ITO films.
关键词
退火
透光率
晶向结构
氧化膜锡膜
大气退火
post-annealing
sheetrisistance
transmittance
crystal structure
thermal stability
