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InP中的深能级杂质与缺陷(续) 被引量:1

Deep Impurities and Defects in InP (Continued)
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出处 《微纳电子技术》 CAS 2008年第11期621-626,共6页 Micronanoelectronic Technology
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共引文献15

同被引文献14

  • 1孙聂枫,周晓龙,陈秉克,孙同年.InP单晶材料现状与展望[J].电子工业专用设备,2005,34(10):10-14. 被引量:10
  • 2杨勋,戴剑,王世超,邓爱红.非掺杂半绝缘态InP中补偿缺陷正电子寿命谱的研究[J].四川大学学报(自然科学版),2006,43(1):129-133. 被引量:1
  • 3Dr adarsh sandhu. Monitoring eyes on indium phosphide [J]. Ⅲ - Vs REVIEW,2004,17(5) :31 -33. 被引量:1
  • 4Sun Fung, Zhao Youwen, Sun Niefeng et al. H - vacancy complex VInH4 abundance and its influences in n - type LEC InP[J]. Journal of crystal growth 2000,211:174 - 178. 被引量:1
  • 5Hirt G, Wolf D, Mller G. Quantitative study of the contribution of deep and shallow levels to the compensation mechanisms in annealed InP [ J ]. J ApplPhys, 1993 (74) :5538 - 5545. 被引量:1
  • 6Fornari R, Gilioli E, Sentiri A et al. Homogeneity of thermally annealed Fe - doped InP wafers [ J ]. Materials science and engineering : B, 1997,44 ( 1 - 3 ) : 233 - 237. 被引量:1
  • 7Zhao Y W, Xu X L, Gong Met al. Formation of Pin defect in annealed undoped LEC InP [ J ]. Appl Phys Lett, 1998(72) :2126 - 2128. 被引量:1
  • 8Zhao Youwen, Dong Hongwei, Jiao Jinghua et al. Preparation of Semi - Insulating Material by Annealing Undoped InP[ J].半导体学报,2002,23(3):285-289. 被引量:1
  • 9Gail Purvis. The idiom of InP [ J ].Ⅲ - V s REVIEW, 2004,17 (3 ):35 -38. 被引量:1
  • 10赵有文,苗杉杉,董志远,吕小红,邓爱红,杨俊,王博.磷化铟中铁原子替位与填隙的热致转变及其对材料性质的影响[J].物理学报,2007,56(9):5536-5541. 被引量:2

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