摘要
针对使用半色调掩膜技术的TFT LCD玻璃基板曝光过程中的衍射和干涉现象进行了分析。文中给出了衍射和干涉现象的理论模型,并且对这两种现象在HTM技术中所起的作用进行了解释,尤其针对不同的狭缝宽度和狭缝间距的结构进行了分析。给出了扫描电镜的图片做为进一步的说明。
Diffraction and interference phenomenon in the halftone mask fine pattern forming process was analyzed. The theoretical model of diffraction and interference was brought forward firstly and its effect at different HTM pattern forming process was explained, especially the patterns with various slit length and intervals. SEM graphs were also provided for the further demonstration.
出处
《液晶与显示》
CAS
CSCD
北大核心
2008年第3期327-333,共7页
Chinese Journal of Liquid Crystals and Displays
