期刊文献+

利用溅射原子角分布规律改进平行板静电场法 被引量:1

Improving parallel electrode method by sputtering atoms' angle distribution rule
原文传递
导出
摘要 用Trim程序计算溅射原子的角分布规律,发现溅射原子出射角服从过余弦分布,利用这一规律,改进了收集方法,使得离子收集效率大大提高. In atomic vapor laser isotope separation (AVLIS) engineering, the parallel electrode method has the advantage of simple structure, but when the extraction voltage is high, the sputtering loss is very large and the collection ratio is very low. This paper calculates the angular distribution of sputtering atoms by Trim code. The results show that the angular distribution follows the cosine rule. The collection method is modified according to the rule, which makes the collection ratio very high.
作者 谢国锋
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2008年第3期1784-1787,共4页 Acta Physica Sinica
  • 相关文献

参考文献14

二级参考文献51

共引文献21

同被引文献14

  • 1Yalin A P, Surla V, Farnell C, et al. Sputtering Studies of Multi-Component Materials by Weight Loss and Cavi- ty Ring-Down Spectroscopy[ R ]. A1AA 2006-4338. 被引量:1
  • 2Yalin A P, Rubin B, Domingue S R, et al. Differential Sputter Yields of Boron Nitride, Quartz, and Kapton Due to Low Energy Xe+ Bombardment[R]. AIAA 2007-5314. 被引量:1
  • 3Yalin A P, Tao L, Sullenberger R, et al. High-Sensitiv- ity Boron Nitride Sputter Erosion Measurements by Con- tinuous- Wave Cavity Ring-Down Spectroscopy [R]. AIAA 2008-5091. 被引量:1
  • 4Topper J L. Total and Differential Sputter Yields of Boron Nitride[ D ]. Colorado: Colorado State University, 2011. 被引量:1
  • 5Peterson P Y, Manzella D H. Investigation of the Ero- sion Characteristics of a Laboratory Hall Thruster [R]. A1AA 2003-5005. 被引量:1
  • 6Britton M, Waters D, Messer R, et al. Sputtering Ero- sion Measurement on Boron Nitride as a Hall Thruster Material[ R ]. NASA-2002-211837. 被引量:1
  • 7Garnier Y, Vicl V, Roussel J F, et al. Low-Energy Xe- non Ion Sputtering of Ceramics Investigated tot Station- ary Plasma Thrusters [J]. Journal of Vacuum Science and Technology, 1999, 17(6): 3246-3254. 被引量:1
  • 8Barral S, Makowski K, Peradzy Z, et al. Wall Material Effects in Stationary Plasma Thrusters. I1. Near-Wall and In-Wall Conductivity[J]. Physics of Plasmas, 2003, 10(10): 4137-4152. 被引量:1
  • 9Gascon N, Dudeck M, Barral S. Wall Material Eficts in Stationary Plasma Thrusters I Parametric Studies of an SPT- 100[J]. Physics of Plasmas, 2003, l0 ( 10): 4123-4136. 被引量:1
  • 10Papageorgopoulos A C, Kamaratos M. Adsorption of Cs on Si(lll)-(7x7) Surfaces: Site Preference and the Near- Metallic State of Cs [J]. Surface ReView Letter, 2001, 8(6): 633-639. 被引量:1

引证文献1

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部