摘要
建立了用电感耦合等离子体质谱仪（ICP-MS）测定高纯氧化钽中28种痕量杂质元素的方法。讨论了质谱干扰及接口效应,采用标准加入法消除基体效应。各元素的方法检出限为0.001-0.1μg/g,回收率为90%-115%,方法适用于纯度为99.999%的高纯氧化钽中痕量杂质元素的测定。
An ICP-MS method is proposed for the determination of 28 trace impurity dements in high purity tantalum oxide. The mass spectral interference and interface effect were discussed. The matrix effect was suppressed by standard addition method. The detection limits for impurities are 0.（301 -0.1 μg/g, The recoveries of standard addition are 90% - 115%. The method has been applied to the determination of trace impurities in high purity tantalum oxide with purity of 99.999 %
出处
《分析试验室》
CAS
CSCD
北大核心
2008年第3期106-109,共4页
Chinese Journal of Analysis Laboratory
