摘要
用MOCVD法在蓝宝石衬底上生长ZnO外延膜。用理学D/m ax 2550转靶衍射仪测量ZnO外延膜织构。观察到试样存在2种晶体取向关系：ZnO[11-20]//A l2O3[10-10]及ZnO[10-10]//A l2O3[10-10]。计算得到晶格取向极点分布平均半高宽为12.26O,且前一种取向晶体的数量是后者的13倍。探讨了2种取向的热力学稳定性。给出了外延膜取向特性的逐层分析结果。
The epilayer ZnO films was grown on c-Al2O3 through metal-organic chemical vapor deposit （MOCVD）. The texture of ZnO films was measured by rotating anode X-ray diffractometer, which model is Rigaku D/max 2550. Two orientation relationships between ZnO films and substrate are ZnO [ 11 -20] //Al2O3 [ 10 - 10] and ZnO [ 10 - 10 ] //Al2O3 [ 10 - 10 ], respectively. The mean ftLll width at half maximum （FWHM） of the top distributing for the lattice orientation is 12.26. The quantities of crystals of the first orientation are 13 times as big as that of the second orientation. The thermodynamics stability of two orientations is discussed, and the orientation results of layer are given step by step.
出处
《实验技术与管理》
CAS
2007年第9期32-34,共3页
Experimental Technology and Management
关键词
ZnO外延膜
晶体取向
织构极图
极点密度
极点密度
分布半高宽
ZnO epilayer film
crystal orientation
texture pole
top density
top density distributing
full width at half maximum
