摘要
研究分析了基底温度、沉积速率、氧气分压、离子束辅助沉积等工艺参数和条件对TiO2膜层折射率的影响。研究表明,随着基底温度升高,TiO2光学膜层折射率呈上升趋势;随着沉积速率提高,TiO2膜层折射率存在极值;采用离子束辅助沉积工艺,可以有效提高TiO2膜层折射率值,所制备的TiO2膜为非晶态结构,具有较高的折射率和较小的光学损耗。
The TiO2 films were grown by ion beam assisted deposition on glass substrates. The influence of the TiO2 film growth conditions, including the substrate temperature, deposition rate, oxygen partial pressure, and ion beam assistance,on the refractive indexes of the films was studied. The microstructures of the films were characterized with X-ray diffraction （XRD） and atomic force microscopy （AFM）. The results show that the substrate temperature, deposition rate and ion beam assistance all strongly affect the optical properties of the films. For example, the refractive index increases with an increase of the substrate temperature, and maximizes at an increasing deposition rate. Besides, the ion beam assistance significantly enhances the refractive index. The TiO2 amorphous films have high refractive index but low optical depletion.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2009年第3期273-276,共4页
Chinese Journal of Vacuum Science and Technology
关键词
TiO2膜层
折射率
镀制工艺
TiO2 optical thin film, Refractive index, Deposition processes
