摘要
采用磁控溅射技术在玻璃基片上制备了非晶态的TiO2-Ag薄膜,用XRD、XPS、STS和椭圆偏光测厚仪等对薄膜的晶体结构、表面成分、电子结构和薄膜厚度进行了测试分析。试验和测试结果表明,薄膜呈非晶态,在薄膜表面存在单质Ag,其与Ti的原子浓度比为1.8∶1。STS测试得到薄膜的禁带宽度为1.8eV。对10mg/L的亚甲基蓝溶液光催化脱色实验表明,随着薄膜厚度的增加,光催化脱色率递增,当厚度达360nm时,薄膜对亚甲基蓝的脱色率在2h达90%以上,当厚度>360nm时,光催化脱色率不再增加;对2mg/L罗丹明B溶液光催化脱色实验表明,其脱色率对薄膜厚度的增加不敏感,薄膜对罗丹明B的脱色率在3h内达到88.7%。
The argentum-doped titanium oxide thin films were deposited on slides by magnetron sputtering,The crystalline phase,surface component and film thickness were determined by XRD,XPS,AFM,STS and Ellipsometric examination.The experiment results showed that TiO2-Ag films are amorphous,and simple substance argentum exists on the surface of film,and the proportion of Ag and Ti is 1.8∶1.The STS spectra showed that the prepared film possesses a band gap of 1.8eV.The result of photodegrading methylene blue which concentration is 10mg/L showed that with the thickness of the film increasing the rate of photodegradation rises.When the thickness of the film is 360nm,the rate of photodegradation is 90% in 2h,and when the thickness of the film is over 360nm,the rate of photodegradation doesn＇t increase.The result of photodegrading rhodamine B which concentration is 2mg/L showed that with the thickness of the film increasing the rate of photodegradation raises a little,the rate of photodegradation is 88.7% in 3h.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2007年第7期1049-1052,共4页
Journal of Functional Materials
基金
重庆大学新型建筑材料重点实验室创新实验室基金资助项目(2006-2007)
