摘要
本文研究了铌酸锂单晶片与石英系光纤之间的耦合问题,以使集成光学器件逐步实用化。石英光纤的折射率在1.45左右,铌酸锂单晶折射率在2.2左右,为改善其间的耦合,我们采用电子迴旋共振微波等离子体化学气相沉积方法,在铌酸锂基片上制备出折射率n为1.78的氮氧化硅膜,并控制其厚度为λ_g/4(λ_g=1.52μm),已使反射率下降73％,可望进一步改善。
The index mismatching between silica fibre and LiNbO3 waveguide is one of the essential obstacles to application of integrated optics devices. This paper presents a novel approach to grow a Silicon Nitride coating with λ/4 in thickness. The reflection has been reduced by 50 percent. More optimized results are respect.
关键词
光波导
光纤
耦合膜
集成光学器件
Optical waveguide
Ontical fiber
Coupling coating
