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MOSFET器件回顾与展望(下) 被引量:1

History and Perspective of MOSFET Device(Ⅱ)
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摘要 介绍了新颖的MOS器件结构及鳍状FET器件研究最新进展,比较了几种主要新颖半导体器件的特性,指出了MOSFET尺寸缩小所面临的巨大挑战及解决办法,展望了器件未来发展趋势。 The progress of the novel MOSFET development and the most advanced MOSFET structure as well as the fin FET device structure were introduced. Comparison on the characteristics of several new devices was given, the great challenges and the solutions to the MOSFET scaling down were also described, the device developing trends were viewed.
出处 《半导体技术》 CAS CSCD 北大核心 2007年第1期1-5,25,共6页 Semiconductor Technology
基金 上海市市级技术研发中心浦东新区科技局匹配资助项目(PKK2005-03)
关键词 金属氧化物半导体场效应管 微电子学 鳍状 MOSFET microelectronics fin
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  • 1HOKAZONA A, OHUCHI K, TAKAYANAGI M, et el. 14 nm gate length CMOSFETs utilizing low thermal budget processwith poly-SiGe and Ni salicide [ C ] // IEDM Meeting.Piscataway, NJ, 2002: 639-642. 被引量:1
  • 2CHAU R, KAVALIEROS J, DOYLE B. A 50 nm depletedsubstrate CMOS transistor [C] //IEDM Meeting. Washington DC, USA, 2001: 621-624. 被引量:1
  • 3林鸿志.纳米电子时代半导体器件技术的开发与进展[J].微电子(中国台湾期刊),2003,2(1):115-125. 被引量:2
  • 4SHAHIDI G G, ANDERSON C A, CHAPPELL B A, et al.A room temperature 0.1μm CMOS on SOI [J]. IEEE TramElectron Devices, 1994, 41 (12) : 2405-2407. 被引量:1
  • 5DORIS B, TEONG M, KANARSKY T, et al. Extreme scaling with ultra-thin Si channel MOSFETs [ C ] ff IEDM Tech Dig. San Francisco, USA, 2002: 51-54. 被引量:1
  • 6UCHIDA K, HIROSHI W, ATSUHIRO K, et al.Experimental study on carrier transport mechanism in ultrathin-body SOI n-and p-MOSFETs with SOI thickness less than 5 nm [ C ] //IEDM Tech Dig. San Francisco,USA, 2002 : 47-50. 被引量:1
  • 7DOYLE B, DATrA S, DOCZY M, et al. High performance fully-depleted tri-gate CMOS transistors [J]. IEEE EDL,2000, 21 (9): 454-455. 被引量:1
  • 8WONG H S P, FRANK D J, SOLOMON P M, et al. Nanoscale CMOS [J]. Proe of IEEE, 1999, 87 (4): 537- 570. 被引量:1
  • 9HISAMOTO D, LEE W C, KEDZIERSKI J, et al. A folded-channel MOSFET for deep-sub-tenth micron era [ C ]//IEDM Tech Dig. San Francisco, USA, 1998: 1032-1034. 被引量:1
  • 10HISAMOTO D, KAGA T, KAWAMOTO Y, et al. A fully depleted lean-channel transistor (DELTA) -A novel vertical ultra thin SOI MOSFET [ C ] // IEDM Teeh Dig. San Francisco, USA, 1989: 833-836. 被引量:1

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