摘要
根据声光腔内调Q对光学薄膜的要求,对1.064μm声光Q开关用融石英低损耗增透膜进行了初步实验研究,通过对工艺因素的比较分析,使用基本配置型国产设备得到了较好的结果。讨论了为降低薄膜损耗,提高薄膜激光损伤阈值应做的几项工作。
Low-loss AR film is a key point for interior cavity resonator acousto-optic Q switch application. Low-loss quartz 1. 064 μm AR film is designed by Powell method. The craft parameters are analyzed to get a better result on the domestic equipment during experiments. The film is firm and its application effect is good. Some problems about improving thin film quality and laser-induced damage thresholds are discussed.
出处
《半导体光电》
EI
CAS
CSCD
北大核心
2006年第4期423-425,共3页
Semiconductor Optoelectronics
关键词
声光调Q
低损耗薄膜
激光损伤阈值
acousto-optic Q switch
low-loss AR film
laser-induced damage thresholds
