摘要
采用磁控溅射方法在1Cr18Ni9Ti不锈钢基体上沉积Ti-Si-N纳米薄膜。结果发现：随着si含量增加,薄膜的晶粒尺寸逐渐变小,晶粒尺寸范围在3nm～20nm之间。薄膜的显微硬度相对于TiN有明显增加,最大硬度可达43.5GPa。Si元素的加入亦改善了膜基结合强度。同时发现,Ti-Si-N纳米薄膜的摩擦系数和比磨损率随着Si含量的增加先减小后增加,其高温摩擦系数明显低于常温,但比磨损率却有显著提高。
Ti-Si-N Nano films were deposited on lCr18Ni9Ti stainless steel by reactive magnetic sputtering. The silicon contents in the films were varied in a range of 0～19.4 at%. The results show that crystallite size decreases with the increase of silicon content, and the microhardness of Ti-Si-N film increase with an certain addition of silicon, the maximum hardness value of films is 43.5 GPa with 9.6 at% silicon content in Ti-Si-N film. The bonding strength of Ti-Si-N is improved compared to TiN film. Furthermore, friction coefficient and wear rate of the Ti-Si-N films decrease firstly and then increase with addition of silicon. It shows a much lower friction coefficient at elevated temperature conditions, however the wear rate increase remarkably.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2005年第12期1882-1885,共4页
Rare Metal Materials and Engineering
基金
国家自然科学基金(50271053
50371067)
国家自然科学基金(50420130033)
科技部973重大基础研究计划项目(2004CB619302)
教育部新世纪优秀人才支持计划项目(NCET-04-0934)
