摘要
阐述了在氮化镓生长中使用的蓝宝石晶片净化的重要性。论述了蓝宝石晶片的净化原理。通过净化试验研究,提出了适合于工业化生产的蓝宝石晶片清洗剂和净化工艺,满足了光电子领域所需的开盒即用的蓝宝石晶片表面质量要求。
The significance of sapphire wafer cleaning in growing of GaN is explained. The cleaning principle of sapphire wafers is discussed. The cleaning solution and technology of the sapphire wafer suitable for industrial production are presented and varified by cleaning experiments. Sapphire wafer can be used in photoelectronics without re-cleaning by this method.
出处
《电子机械工程》
2005年第6期42-45,共4页
Electro-Mechanical Engineering
基金
国家863计划基金资助项目(2002AA311010)
江苏省教育厅自然科学研究计划基金资助项目(04KJD430213)
关键词
蓝宝石晶片
净化工艺
清洗剂
sapphire wafer
cleaning technology
cleaning solution
