摘要
利用电弧离子镀技术在不锈钢、硅衬底及玻璃衬底上沉积了ＴｉＮ薄膜，并在大气环境下进行了７００℃３０ｍｉｎ退火处理。测量了其退火前后的硬度，Ｘ射线分析了退火前后的成分，对硅衬底上沉积的薄膜则测量了退火前的电阻率变化。在玻璃衬底上改变实验条件沉积了不同颜色的薄膜，测量了不同色泽薄膜的电阻率和制备条件的关系。对退火后薄膜内微观结构的变化进行初步分析，由此讨论了退火后薄膜硬度及电阻率变化的原因，并解释了制备条件变化及退火处理对所制薄膜色泽影响及机理。
We deposited TiN films on different substrates-stainless steel,silicon wafer and glass substrate by arc-likeion-plating.The films were annealed for half an hour in air,oxidation temperature was 973K.We measured the hardness of the films before and after annealing,analyzed their compositions by XRD.We measured the changing of the resistlvity of the films on silicon wafer before and after annealing.The films of different color were deposited on the glass substrates wit h different experimental conditions,the resistivity of different color films was measured.Then,we analyzed the reason of the changes of hardness and resistivity of the films after the annealing process,discussed the effects of the annealing process and the experimental condition on the color of the films.
出处
《功能材料》
EI
CAS
CSCD
1996年第1期95-96,共2页
Journal of Functional Materials
