摘要
本文首次用偏最小二乘(PLS)法对SAF-CTMAB-W,Mo,Ti混合显色体系的四阶导数光谱进行解析,提出了同时测定痕量钨、钼、钛的计算分析方法。在0.5mol/LHCl介质中,W,Mo,Ti的SAF-CTMAB显色体系的四阶导数光谱摩尔响应系数(双峰)分别为2.3×106,2.1×106和5.9×105,比常规光度法高出4.5~16.8倍。该法用于合成样品和钢样中钨、钼、钛的同时测定,相对误差在±8%以内。
The 4th-derivative spectra of the mixed color system of SAF-CTMAB- (W, Mo,Ti) are analysed by partial least squares(PLS) method, and the computerized analysis for the simultaneous determination of trace tungsten, molybdenum and titanium is described. In the medium of 0.5mol/L HCl, the molar responsive coefficients of 4th-derivative spectra, which are 4,5-16. 8 times as high as that of routine spectrophotometry, in the systems of SAF-CTMAB-W, Mo, Ti are respectively 2. 3× 106, 2. 1× 106 and 5. 9 × 105. The method has been applied to the simultaneous determination of tungsten, molybdenum and titanium in artificial and steel samples, and the relative errors are with in ±8%.
出处
《光谱学与光谱分析》
SCIE
EI
CAS
CSCD
北大核心
1995年第4期119-124,共6页
Spectroscopy and Spectral Analysis
关键词
导数光谱
钨
钼
钛
水杨基荧光酮
钢
Derivative spectrum,Partial least squares method, Tungsten molybdenum titanium
Simultaneous determination, Salicylfluorone.