摘要
在(100)硅上制作边沿<100>晶向的长方形掩模,用KOH各向异性腐蚀液腐蚀可制得竖直微镜,这种微镜存在凸角削角问题。研究了边沿<100>晶向掩模的凸角补偿技术,提出了2种凸角补偿图形,并应用于竖直微镜制作。实验表明“工”形补偿可获得方正的反射面;“Y”形补偿的微镜,反射面呈底角为75.96°的梯形。经补偿后的微镜,可提高光开关切换光束效率。讨论了(100)硅的<100>晶向掩模凸角补偿技术应用于微机械加速度计质量块制作的可能性。
The vertical micromirror can be fabricated with the mask which sides aligned the <100> direction on silicom(100)etched by aqueous KOH.It has under cutting near the convex corner.The compensation technique for convex corner undercutting using <100> mask is studied and two kinds of additional mask patterns are presented.This technique has been used in fabricating vertical mirrors.The “工” shape mask can get rectangle reflective face.The “Y” shape mask can get trapezoid reflective face with the angle of 75.96°.The efficiency to switch laser beam can be improved for optical switch.This compensation technology of the <100> direction on silicon (100) may be applied on fabricating the mass block for micro-mechanical accelerometer.
出处
《传感器技术》
CSCD
北大核心
2005年第7期22-24,共3页
Journal of Transducer Technology
基金
国家重点基础研究发展规划资助项目(G1999033104)
关键词
各向异性腐蚀
削角补偿
微镜
微机械加工
anisotropic etching
corner cutting compensation
micro-mirror
micromachinging
