摘要
提出一种新型的电子束曝光数据格式,引入了面向对象的设计和适应于矢量型电子束扫描方式的设计,提高了对通用图形数据格式转换的精确度和效率,同时更便于对电子束曝光机的曝光控制。该设计已在电工所的科研项目“纳米级电子束曝光系统”中得到应用,被称之为EDF数据格式。
Based on the Objected-oriented ideas, a new file format was designed for the E-beam lithography, especially for the vector type machine. With the use of this format the format conversion was more precise and convenient, as well as, the data transformation was more efficient. The format, named as EDF, has been applied to the project of Nano-electron Beam Lithography System.
出处
《微细加工技术》
EI
2005年第2期24-27,45,共5页
Microfabrication Technology
关键词
电子束曝光机
数据格式转换
面向对象的设计
矢量型电子束扫描
<Keyword>electron beamlithography
data format conversion
objected oriented design
vector
scanning electron beam
