摘要
近年，作为固体表面一项新的低温成膜工艺，光化学气相沉积已经取得了显著进展。本文从光化学原理角度出发，介绍了光化学气相沉积反应的能量过程及生长机理，并展望了它的今后发展前景。
In recent years there are important developments in photochemical vapor deposition as a new thin film deposition technique on solid state surface at low temperature. This article introduced the energy path and michanism of photochemical vapor deposition based on photochemistry principle, and showh the future of the development.
出处
《真空科学与技术》
CSCD
1994年第4期294-298,共5页
Vacuum Science and Technology
基金
河北省教委科学基金
