摘要
文章介绍了近年来铜钨(钼)薄膜涂层的刺备方法,简单分析了薄膜的结构特征和应用,展望了未来的研究方向和应用前景。
This paper introduces the methods of recent years for making preparations of Cu-W (Mo) thin films, with a brief analysis of their structure characteristics and applications.The future development and prospects of Cu-W (Mo) thin films are reviewed as well.
出处
《东莞理工学院学报》
2005年第1期20-24,共5页
Journal of Dongguan University of Technology
关键词
薄膜
制备
应用
溅射
热控制
thin film
preparations
applications
sputtering
thermal management
