摘要
针对高能电子束撞击重金属靶产生轫致辐射光子,利用蒙特卡罗方法详细研究了电子束半径与发射度以及靶的厚度对X光源特性的影响 结果表明:电子束半径与发射度不仅是影响照射量的主要因素,也是造成照射量分布不均匀的主要原因;给定电子束,存在一个靶厚度使得靶前1m处的照射量最大 因此,在X射线成像系统的设计和模拟过程中,应综合考虑电子束半径与发射度和靶厚的影响.
The characteristic of X-ray source is one of the most important parameters on the image quality of radiography. The X-ray source is composed of bremsstrahlung photons produced by the high-energy electron beam impinging on the heavy metal target. The effects of parameters (include radius and emittance of the e-beam and the target thickness) on the characteristic of X-ray source are detailed by means of Monte Carlo method. It is shown that (1) giving a e-beam radius, the exposure at 1 m from the converting target increases and the uniformity of exposure distribution becomes bad, when the normalized emittance of e-beam decreases; (2) for a given normalized emittance, the exposure uniformity becomes bad, when the e-beam radius increases, but there exists an e-beam radius under which the exposure at 1 m is the largest; (3) in the case of zero emittance, enlarging the e-beam radius can slightly improve the uniformity; and (4) given an e-beam, there exists a target thickness which causes the exposure at 1 m to be the largest. Therefore, the radius and emittance of e-beam and the target thickness should be integrated with the design and Monte Carlo simulation for radiography.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2005年第2期209-213,共5页
Acta Photonica Sinica
基金
国防科技基础研究基金资助课题
关键词
MC模拟
电子束参数
转换靶
照射量
Monte carlo simulation
Parameters of the electron beam
Converting target
Exposure
