摘要
以N ,N -二甲基苯胺为催化剂、对羟基苯甲醚为阻聚剂 ,利用聚乙二醇二缩水甘油醚 (PEGDE)和丙烯酸为两种主要原料合成了一种低黏度光敏预聚物———聚乙二醇二缩水甘油醚二丙烯酸酯。研究了反应温度、阻聚剂、催化剂用量这些因素对其反应的影响 ,结果表明优化的合成反应条件是温度 90～ 10 5℃、m(催化剂 )∶m(PEGDE) =(0 0 0 7～ 0 0 0 9)∶1、m(阻聚剂 )∶m(PEGDE) =(0 0 0 2～ 0 0 0 4 )∶1。同时 ,把产物作为光敏预聚物配成光固化涂料对其光固化膜进行了性能测试 。
It was reported that utilizing polyethyleneglycol diglycidylether(PEGDE) and acrylic acid as two main materials synthesized the photosensitive prepolymer of polyethyleneglycol diglycidylether diacrylate, with N,N -dimethylaniline being the catalyst and p -hydroxyanisole being the inhibitor. The effects of temperature, dosages of the catalyst and the inhibitor in the reaction were studied, which shows that the preferable synthesizing conditions are the reaction temperature (90～105?℃), the dosage of the catalyst [ m (catalyst)∶ m (PEGDE)=(0 007～0 009)∶1] and the dosage of the inhibitor [ m (inhibitor)∶ m (PEGDE)=(0 002～0 004)∶1]. Meanwhile, the UV-curing coating was prepared with polyethyleneglycol diglycidylether diacrylate as prepolymer, and the properties of its cured film were determined. The results showed that the flexible property of the cured film was superior to that of the other cured film which its UV-curing coating was prepared to cure with epoxy acrylate as prepolymer.
出处
《化工进展》
EI
CAS
CSCD
北大核心
2004年第7期743-746,共4页
Chemical Industry and Engineering Progress
