摘要
利用金属蒸发真空多弧离子源(MEVVA源)注入机将Ti+离子注入到高纯石英玻璃衬底中,离子注入的加速电压为20 k V,注入剂量为1.5×1017和3×1017ions/cm2,将注入样品在氧气气氛下进行热退火处理,制备了TiO2纳米薄膜。采用光吸收谱、拉曼光谱、X射线光电子能谱、扫描电子显微镜和透射电子显微镜对注入样品进行了测试和表征,分析了TiO2薄膜的形成机理。在热退火过程中衬底中离子注入的Ti原子向外扩散到衬底表面被氧化形成了TiO2。TiO2的形成、晶粒尺寸和晶体结构依赖于热退火温度,而形成TiO2薄膜的厚度主要受离子注入剂量和热退火时间的影响。实验结果表明,该方法制备的TiO2纳米薄膜将有望应用于制备具有光催化、自清洁等特殊性能的自清洁玻璃。
TiO2 nanofilms on the surface of fused silica have been fabricated by Ti+ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by Ti+ions at 20 k V with fluences of 1.5 and 3×1017ions/cm2 using a metal vapor vacuum arc(MEVVA) ion source implanter.The optical absorption spectroscopy, Raman scattering spectroscopy, X-ray photoelectron spectroscopy(XPS),scanning electron microscopy(SEM), and transmission electron microscopy(TEM) measurements were done to figure out formation mechanism of the TiO2 nanofilms. The formation of TiO2 nanofilms resulted from outdiffusion of the implanted Tiions to the substrate surface, where they were oxidized into TiO2. The formation,grain size and the crystallographic phase of TiO2 are annealing temperature dependent, and TiO2 nanofilm thickness can be well tailored by controlling the implantation fluence and annealing time. Results show that the TiO2 nanofilms fabricated by this novel method have great potential in applications such as photocatalytic,antibacterial and self-cleaning glass.
出处
《原子核物理评论》
CAS
CSCD
北大核心
2015年第2期242-248,共7页
Nuclear Physics Review
基金
国家自然科学基金资助项目(11405280)
河南省教育厅科学技术研究重点项目(14B140021)
周口师范学院博士科研启动经费资助项目(zksybscx201210)~~
关键词
离子注入
热退火
TIO2
Ion implantation
thermal annealing
TiO2
