摘要
结合电弧熔炼及去气剂提纯金属钆,金属杂质含量显著降低,具体除杂量与其初始浓度有关。去气剂去除间隙杂质效果明显,钆中氧浓度由180~200 mg/L降为80~100 mg/L。所得高纯钆用等离子发射光谱(ICP)测金属杂质,用氧氮分析仪测量氧含量,并对试验过程及结果进行讨论。
A novel in-situ ultra purification technique incorporating both arc melting'and external gettering'was devised. The purification experiments were carried out on2 N purity raw gadolinium. These main impurities had a tendency of reduction,In addition,it was found that each removal degree is attributable to a differential refining effect caused by the difference of initial impurity concentration. metallic impurities( viz. Si,Ca,Ni, Al,Mg etc.) as analyzed by inductively coupled plasma optical emission spectroscopy( ICPS). The trace oxygen as analyzed by O-N analyzer reduced from180 ~200 mg / L for raw Gd to 80 ~100 mg / L. The different process parameters were optimized and the analysis results were discussed.
出处
《材料保护》
CAS
CSCD
北大核心
2013年第S2期28-29,共2页
Materials Protection
基金
国家科技部"国家重大目标导向"973课题(2012 CBA01207
稀土无水卤化物及金属高纯化过程的科学基础)资助
