摘要
膜层耐磨性能的测量与评价已成为硬质薄膜技术发展与应用的关键问题。球磨技术采用连续回转运动的GCr15轴承钢球带动悬浮液中的金刚石颗粒(直径为1.5μm)对试样进行球磨,通过对"圆环状"磨痕内外圈直径的测量,并利用提出的单位磨损率概念评价其耐磨性。以非平衡磁控溅射/阳极离子束沉积法在SKD11不锈钢基体上制备的Cr/α-C:H多层膜为研究对象,采用球磨法检测耐磨性能,磨球转速为200 r/min(0.26 m·s-1),对试样的压力载荷为0.45 N,球磨圈数在50～800之间。并通过体式显微镜,原子力显微镜以及扫描电镜对薄膜的磨损情况进行表面观察。经对实验数据的分析,球磨圈数350为耐磨临界值,测得Cr/α-C:H膜的单位磨损率δ为8.87×10-9(mm4·mm-2)。结果表明,薄膜在微粒磨损的作用下,其去除机制主要以微切削和犁沟为主。
Measurement and evaluation of wearing resistance of films is one of the key problems for development and applications of hard film technology.Ball cratering is a well-established technique for the generation of micro-abrasion by means of a rotating steel ball(GCr15) continuously fed by an abrasive slurry containing diamond particle(diameter is 1.5 μm).The concept of unit abrasive rate was put forward to evaluate abrasion resistance by measuring the diameter of the inner and outer of circularity scar.The abrasion resistance was measured for with Cr/α-C:H multilayer films prepared on the SKD11 stainless steel substrate by the technique of unbalanced magnetron sputter and anode ion beam deposition,rotate speed of ball of 200 r/min(0.26 m·s-1),normal pressure of 0.45 N,and the range of rotation turns of 50～800.To observe the surface topography of scar,style microscope,atomic force microscopy and scanning electron microscope were employed to identify TiN film failure threshold by the reflected signal detection.By analyzing the experimental result,the critical value of abrasion resistance is determined as 350 cycles,and the unit abrasive rate of Cr/α-C: H film is 8.87×10-9(mm4·mm-2).It is shown that the removal mechanism could be attributed to micromachining and ploughing for film,which is under the influence of micro-abrasive.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2013年第S2期553-557,共5页
Rare Metal Materials and Engineering
基金
国家自然科学基金(51275247)
中国博士后科学基金(2011M500924)
总装备部预研基金(9140A18070209BQ02)
国家部委"十一五"预研基金(62301090103)
江苏省研究生创新基金(CX10B_113Z)
关键词
球磨
微粒磨损
α-C:H膜
金刚石颗粒
耐磨性
ball cratering
micro-abrasive
α-C:H film
diamond particle
abrasion resistance
