摘要
为分析和解决商业用SU-8胶在355 nm波长的吸收性和后烘缩胶等问题,先采用柱层析对SU-8环氧树脂进行分离,然后进一步用高压液相色谱-尺寸排阻色谱法对SU-8环氧树脂进行分离和分析。结果表明,SU-8环氧树脂包括SU-1,SU-2,SU-4,SU-6和SU-8多种组分及其它杂质,分子量分布在100-100 000的范围。根据分析结果,研究了上述问题出现的原因,并配制了性能优化的SU-8光刻胶,结合全息光刻技术制作了三维光子晶体。
For analysis and solution the problems of absorbency of the commercial Epon SU-8 photoresist at 355 nm and its post-bake shrink, Epon SU-8 was firstly separated using the column chromatography, and then it was further separated and analyzed by high pressure liquid chromatography and size exclusion chromatography. The results indicate that Epon SU-8 includes SU-1, SU-2, SU-4, SU-6, and SU-8 components and other impurities, and their molecular weight describes in a range of 100-100000. After the reason which the above problems appear was studied by the analysis results, a SU-8 photoresist with excellent properties was made and it was used to fabricate the 3-D photonic crystals together with holographic lithography.
出处
《微细加工技术》
EI
2007年第2期13-15,33,共4页
Microfabrication Technology
基金
国家自然科学基金资助项目(60408004)
