摘要
扫描探针显微术（ＳＰＭ）是８０年代初发展起来的一类新型表面研究技术。由于其分辨率高、易操作和可扩展性，扫描探针显微术越来越受到人们的重视。１９８６年Ｇ．宾尼希（Ｇ．Ｂｉｎｎｉｎｇ）和Ｈ．罗雷尔（Ｈ．Ｒｏｈｒｅｒ）为此获得了诺贝尔物理学奖。本文中我们详细阐述扫描隧道显微镜（ＳＴＭ）、原子力显微镜（ＡＦＭ）、扫描电容显微镜（ＳＣＭ）、扫描热显微镜（ＳＴｈＭ）等几种扫描探针显微术的工作原理，也描述了人们在探索利用探针和表面间的高度局域相互作用实现材料纳米结构制备方面所进行的工作，重点分析扫描探针显微技术在半导体材料测量和半导体纳米结构制备方面的应用。
Scanning probe microscopy (SPM),a new technology to analyses the solid surface,is developed in 1980's.But it has gotten more and more attention because of its highresolution,easyoperation,easy-extension.In 1986,G.Binning and H.Rohrer were awarded Nobel Prize because of their great ideas on SPM.In this article,the principle of scanning tunneling microscopy,atomic force microscopy,scanning capacitance microscopy,scanning thermal microscopy were described in detail.And the very located interaction between tip and surface which is used to prepare the nano-structure in the material is written in this article also.Especially the application of the analysis on semiconductor surface and the nanofabrication of semiconductor is emphasized in this article.We also point out the large prospect of SPM.
出处
《功能材料》
EI
CAS
CSCD
北大核心
1999年第2期143-146,共4页
Journal of Functional Materials
关键词
扫描探针显微术
半导体
纳米刻蚀
砷化镓
SPM(scanning probe microscopy)
semiconductor
surface
nanofabrication
