摘要
扫描电镜电子束纳米刻蚀鲁武,顾宁,陆祖宏,韦钰(东南大学分子与生物分子电子学实验室,南京210018)沈浩赢,张岚(南京电子器件研究所,南京210016)随着超大规模集成电路集成度的提高,尤其是某些特种器件如高电子迁移率场效应管、高频声表面波器件的出...
A scanning electron microscope(SEM)has been modified for a high resolution electronbeam exposure system. Sandwich construction films composed by polymethylmethacrylate(PMMA)films and EB 250A resist films on GaAs substrate prepared by spin cast techniques have been exploredas high resolution electron beam resists,90 nm lines and 5μm spaces grating patter ns have recentlybeen achieved by using the system.
出处
《东南大学学报(自然科学版)》
EI
CAS
CSCD
1994年第1期117-119,共3页
Journal of Southeast University:Natural Science Edition
关键词
SEM
电子束
刻蚀
VLSI
纳米量级
electron beams
scanning electron microscope
lithography