Industrially produced sodium water glasses were dried in climates with controlled temperature and humidity to transparent amorphous water containing sodium silicate materials. The water glasses had molar SiO2:Na2O rat...Industrially produced sodium water glasses were dried in climates with controlled temperature and humidity to transparent amorphous water containing sodium silicate materials. The water glasses had molar SiO2:Na2O ratios of 2.2, 3.3 and 3.9 and were dried up to 84 days at temperatures between 40°C and 95°C and water vapour pressures between 5 and 40 kPa. The materials approached final water concentrations which are equilibrium values and are controlled by the water vapour pressure of the atmosphere and the microstructure of the solids. The microstructure of the dried water glasses was characterized by atomic force microscopy. It has a nanosized substructure built up by the silicate colloids of the educts but deformed by capillary forces. In the final drying equilibrium, the water vapour pressure of the atmosphere in the drying cabinet is equal to the reduced vapour pressure of the capillary system built up by the silicate colloids. Their size scale can be explained by the deformation of colloidal aggregates due to capillary forces.展开更多
We demonstrated a simple and effective dual-templating approach for the synthesis of hierarchically mesocellular carbon foams by using nonionic surfactant of sorbitan monooleate and silica colloid particles as sacrifi...We demonstrated a simple and effective dual-templating approach for the synthesis of hierarchically mesocellular carbon foams by using nonionic surfactant of sorbitan monooleate and silica colloid particles as sacrificial templates, and resorcinol/ formaldehyde as carbon source. The representative carbon foam has dual mesopore sizes of 4 and 10 nm, and possesses the specific surface area of 580 m^2/g and the total pore volume of 0.80 cm^3/g.展开更多
A new industrial method has been developed to produce polydisperse spherical colloidal silica particles with a very broad particle size,ranging from 20-95 nm.The process uses a reactor in which the original seed solut...A new industrial method has been developed to produce polydisperse spherical colloidal silica particles with a very broad particle size,ranging from 20-95 nm.The process uses a reactor in which the original seed solution is heated to 100 ℃,and then active silicic acid and the seed solution are titrated to the reactor continuously with a constant rate.The original seeds and the titrated seeds in the reactor will go through different particle growth cycles to form different particle sizes.Both the particles＇ size distribution and morphology have been characterized by dynamic light scattering（DLS）and the focus ion beam（FIB） system.In addition,the as-prepared polydisperse colloidal silica particle in the application of sapphire wafer＇s chemical mechanical polishing（CMP） process has been tested.The material removal rate（MRR） of this kind of abrasive has been tested and verified to be much faster than traditional monodisperse silica particles.Finally,the mechanism of sapphire CMP process by this kind of polydisperse silica particles has been investigated to explore the reasons for the high polishing rate.展开更多
文摘Industrially produced sodium water glasses were dried in climates with controlled temperature and humidity to transparent amorphous water containing sodium silicate materials. The water glasses had molar SiO2:Na2O ratios of 2.2, 3.3 and 3.9 and were dried up to 84 days at temperatures between 40°C and 95°C and water vapour pressures between 5 and 40 kPa. The materials approached final water concentrations which are equilibrium values and are controlled by the water vapour pressure of the atmosphere and the microstructure of the solids. The microstructure of the dried water glasses was characterized by atomic force microscopy. It has a nanosized substructure built up by the silicate colloids of the educts but deformed by capillary forces. In the final drying equilibrium, the water vapour pressure of the atmosphere in the drying cabinet is equal to the reduced vapour pressure of the capillary system built up by the silicate colloids. Their size scale can be explained by the deformation of colloidal aggregates due to capillary forces.
文摘通过水热-垂直沉积法制备了一种新型的荧光光子晶体薄膜,得到的荧光光子晶体具有鲜艳的色彩和良好的荧光性能.此薄膜在460 nm处有明显的反射峰,在440 nm处有很强的荧光峰.将此荧光光子晶体薄膜作为染料敏化太阳能电池背反射层时,可以将开路电压由0.75 V提高到0.77 V,短路电流由7.64 m A/cm2提高到8 m A/cm2,光电转换效率由4.13%提高到4.23%,可以提高2.42%的光电转换效率.
基金supported by the National Natural Science Foundation of China(Nos.20473057 and 20673076)Shanghai Nanotechnology Promotion Center(Nos.0652nm030 and 0752nm006).
文摘We demonstrated a simple and effective dual-templating approach for the synthesis of hierarchically mesocellular carbon foams by using nonionic surfactant of sorbitan monooleate and silica colloid particles as sacrificial templates, and resorcinol/ formaldehyde as carbon source. The representative carbon foam has dual mesopore sizes of 4 and 10 nm, and possesses the specific surface area of 580 m^2/g and the total pore volume of 0.80 cm^3/g.
基金Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China(Grant No.2009ZX02030-1)the National Natural Science Foundation of China(Grant No.51205387)the Science and Technology Commission of Shanghai,China(Grant No. 11nm0500300),and the Science and Technology Commission of Shanghai,China(Grant No. 14XD1425300)
文摘A new industrial method has been developed to produce polydisperse spherical colloidal silica particles with a very broad particle size,ranging from 20-95 nm.The process uses a reactor in which the original seed solution is heated to 100 ℃,and then active silicic acid and the seed solution are titrated to the reactor continuously with a constant rate.The original seeds and the titrated seeds in the reactor will go through different particle growth cycles to form different particle sizes.Both the particles＇ size distribution and morphology have been characterized by dynamic light scattering（DLS）and the focus ion beam（FIB） system.In addition,the as-prepared polydisperse colloidal silica particle in the application of sapphire wafer＇s chemical mechanical polishing（CMP） process has been tested.The material removal rate（MRR） of this kind of abrasive has been tested and verified to be much faster than traditional monodisperse silica particles.Finally,the mechanism of sapphire CMP process by this kind of polydisperse silica particles has been investigated to explore the reasons for the high polishing rate.
