The development of advanced and cost-effective methods is of prime importance for manufacturers of high purity gases. In this paper a new strategy in the development of gas flow purification technologies is described,...The development of advanced and cost-effective methods is of prime importance for manufacturers of high purity gases. In this paper a new strategy in the development of gas flow purification technologies is described, where instead of adsorbents reactants are used, in which not only the surface is used in gas capturing but the entire volume of the material. Moreover, the reactants are activated in the gas flow by a controlled mechanical tool, which keeps the sorption kinetics at the required highest level and reduces the unproductive losses of the consumed reactant almost to zero. The advantages of the method are demonstrated with the examples of two novel gas purification units that are distinguished with uncomplicated design, serviceability and ultimately high purification efficiency.展开更多
The variation of impurity concertation in the ultra-high purity (UHP) gases, delivered from cryogenic storage tanks and transported through long pipes, is a major problem in systems like those used in semiconductor ma...The variation of impurity concertation in the ultra-high purity (UHP) gases, delivered from cryogenic storage tanks and transported through long pipes, is a major problem in systems like those used in semiconductor manufacturing facilities. A method is developed for stabilizing the purity and reducing the gas consumption in these systems. This technique uses a dynamically controlled mixing of gases supplied by multiple cryogenic tanks. The control scheme uses software modules that simulate the processes that cause purity variation in both the cryogenic tanks and the transport lines. These processes include vaporization and supply in tanks, various modes of transport in delivery pipes, and the adsorption and desorption on surfaces. The method also includes and corrects for variations caused by transience in gas usage rate as well as ambient conditions.展开更多
文摘The development of advanced and cost-effective methods is of prime importance for manufacturers of high purity gases. In this paper a new strategy in the development of gas flow purification technologies is described, where instead of adsorbents reactants are used, in which not only the surface is used in gas capturing but the entire volume of the material. Moreover, the reactants are activated in the gas flow by a controlled mechanical tool, which keeps the sorption kinetics at the required highest level and reduces the unproductive losses of the consumed reactant almost to zero. The advantages of the method are demonstrated with the examples of two novel gas purification units that are distinguished with uncomplicated design, serviceability and ultimately high purification efficiency.
文摘The variation of impurity concertation in the ultra-high purity (UHP) gases, delivered from cryogenic storage tanks and transported through long pipes, is a major problem in systems like those used in semiconductor manufacturing facilities. A method is developed for stabilizing the purity and reducing the gas consumption in these systems. This technique uses a dynamically controlled mixing of gases supplied by multiple cryogenic tanks. The control scheme uses software modules that simulate the processes that cause purity variation in both the cryogenic tanks and the transport lines. These processes include vaporization and supply in tanks, various modes of transport in delivery pipes, and the adsorption and desorption on surfaces. The method also includes and corrects for variations caused by transience in gas usage rate as well as ambient conditions.
