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Optimization of Laser Ablation Technology for PDPhSM Matrix Nanocomposite Thin Film by Artificial Neural Networks-particle Swarm Algorithm 被引量:3
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作者 唐普洪 宋仁国 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2010年第2期188-193,共6页
A new thermal ring-opening polymerization technique for 1, 1, 3, 3-tetra-ph enyl-1, 3-disilacyclobutane (TPDC) based on the use of metal nanoparticles produced by pulsed laser ablation was investigated. This method ... A new thermal ring-opening polymerization technique for 1, 1, 3, 3-tetra-ph enyl-1, 3-disilacyclobutane (TPDC) based on the use of metal nanoparticles produced by pulsed laser ablation was investigated. This method facilitates the synthesis of polydiphenysilylenemethyle (PDPhSM) thin film, which is difficult to make by conventional methods because of its insolubility and high melting point. TPDC was first evaporated on silicon substrates and then exposed to metal nanoparticles deposition by pulsed laser ablation prior to heat treatment.The TPDC films with metal nanoparticles were heated in an electric furnace in air atmosphere to induce ring-opening polymerization of TPDC. The film thicknesses before and after polymerization were measured by a stylus profilometer. Since the polymerization process competes with re-evaporation of TPDC during the heating, the thickness ratio of the polymer to the monomer was defined as the polymerization efficiency, which depends greatly on the technology conditions. Therefore, a well trained radial base function neural network model was constructed to approach the complex nonlinear relationship. Moreover, a particle swarm algorithm was firstly introduced to search for an optimum technology directly from RBF neural network model. This ensures that the fabrication of thin film with appropriate properties using pulsed laser ablation requires no in-depth understanding of the entire behavior of the technology conditions. 展开更多
关键词 nanocomposite thin film pulsed laser depositionpld artificial neural net- works(ANN) particle swarm optimization (PSO)
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Annealing time dependent structural, morphological, optical and electrical properties of RF sputtered p-type transparent conducting SnO_2/Al/SnO_2 thin films 被引量:1
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作者 Keun Young PARK Ho Je CHO +2 位作者 Tae Kwon SONG Hang Joo KO Bon Heun KOO 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第S1期129-133,共5页
Transparent p-type conducting SnO2/Al/SnO2 multilayer films were fabricated on quartz substrates by radio frequency(RF) sputtering using SnO2 and Al targets. The deposited films were annealed at a fix temperature of 5... Transparent p-type conducting SnO2/Al/SnO2 multilayer films were fabricated on quartz substrates by radio frequency(RF) sputtering using SnO2 and Al targets. The deposited films were annealed at a fix temperature of 500 °C for different time durations(1-8 h). The effect of annealing time on the structural, morphological, optical and electrical performances of SnO2/Al/SnO2 multilayer films was studied. X-ray diffraction(XRD) results show that all the p-type conducting films possess polycrystalline SnO2 with tetragonal rutile structure. Hall-effect results indicate that 500 °C for 1 h is the optimum annealing condition for p-type SnO2/Al/SnO2 multilayer films, resulting in a hole concentration of 1.14×1018 cm-3 and a low resistivity of 1.38 ?·cm, respectively. The optical transmittance of the p-type SnO2/Al/SnO2 multilayer films is above 80% within annealing time range of 1-8 h, showing maximum for the films annealed for 1 h. 展开更多
关键词 pulsed laser deposition(pld) transparent conducting oxide(TCO) P-TYPE multi-layer TRANSMITTANCE
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Optimization of large-area YBa_(2)Cu_(3)O_(7-δ)thin films by pulsed laser deposition for planar microwave devices 被引量:1
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作者 熊沛雨 陈赋聪 +8 位作者 冯中沛 杨景婷 夏钰东 袁跃峰 王旭 袁洁 吴云 石兢 金魁 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第7期186-190,共5页
This paper presents high quality YBa_(2)Cu_(3)O_(7-δ)(YBCO)thin films on LaAlO_(3)substrate for microwave devices prepared by pulsed laser deposition(PLD).The double-sided YBCO films cover a large area and have been ... This paper presents high quality YBa_(2)Cu_(3)O_(7-δ)(YBCO)thin films on LaAlO_(3)substrate for microwave devices prepared by pulsed laser deposition(PLD).The double-sided YBCO films cover a large area and have been optimized for key parameters relevant to microwave device applications,such as surface morphology and surface resistance(R_(s)).This was achieved by improving the target quality and increasing the oxygen pressure during deposition,respectively.To evaluate the suitability of the YBCO films for microwave devices,a pair of microwave filters based on microstrip fabricated on films from this work and a commercial company were compared.The results show that the YBCO films in this work could completely meet the requirements for microwave devices. 展开更多
关键词 YBCO films pulsed laser deposition(pld) surface resistance microwave devices
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Electrical and magnetic properties of ZnNiO thin films deposited by pulse laser deposition
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作者 Jie JIANG Xue-tao WANG Li-ping ZHU Li-qiang ZHANG Zhi-guo YANG Zhi-zhen YE 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2011年第7期561-566,共6页
ZnNiO thin films with different contents of Ni(0-10 at.%) were fabricated on quartz and Si(100) substrates by pulsed laser deposition(PLD).We measured the samples by X-ray diffraction(XRD),field-emission scanning elec... ZnNiO thin films with different contents of Ni(0-10 at.%) were fabricated on quartz and Si(100) substrates by pulsed laser deposition(PLD).We measured the samples by X-ray diffraction(XRD),field-emission scanning electron microscope(FE-SEM),X-ray photoelectron spectroscopy(XPS),ultraviolet-visible spectrometer(UV-VIS),and Hall testing.When the Ni contents were below 3 at.%,partial Zn2+ ions were replaced by the Ni2+ ions without forming any other phases,which enhanced the conductivity of the film.When the Ni contents were above 3 at.%,Ni ions were at the interstitial sites,and Ni-related clusters and defects were able to emerge in the films,resulting in a worsening of electrical and optical properties.A ferromagnetic hysteresis with a coercive force of approximately 30 Oe was observed in the ZnNiO film with a Ni content of 3 at.% at room temperature. 展开更多
关键词 ZnNiO thin films Electric property FERROMAGNETIC TRANSMITTANCE Pulsed laser deposition(pld)
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Enhanced energy-storage density and temperature stability of Pb_(0.89)La_(0.06)Sr_(0.05)(Zr_(0.95)Ti_(0.05))O_(3) anti-ferroelectric thin film capacitor 被引量:1
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作者 Zhenhua Tang Songcheng Hu +8 位作者 Dijie Yao Zeli Li Zhigang Liu Xiaobin Guo Biao Lu Jingmin Fan Xin-Gui Tang Sheng-Guo Lu Ju Gao 《Journal of Materiomics》 SCIE 2022年第1期239-246,共8页
As the fundamental energy storage components in electronic systems,dielectric capacitors with high power densities were demanded.In this work,the anti-ferroelectric Pb_(0.89)La_(0.06)Sr_(0.05)(Zr_(0.95)Ti_(0.05))O_(3)... As the fundamental energy storage components in electronic systems,dielectric capacitors with high power densities were demanded.In this work,the anti-ferroelectric Pb_(0.89)La_(0.06)Sr_(0.05)(Zr_(0.95)Ti_(0.05))O_(3)(PLSZT)ceramics and thin film capacitor were successfully fabricated by a solid-state reaction route and pulsed laser deposition method,respectively.The ferroelectric,dielectric,energy-storage properties,and temperature stability of anti-ferroelectric PLSZT capacitor were investigated in detail.By compared with the PLSZT ceramic(energy storage density is 1.29 J/cm^(3) with an efficiency of 78.7%under 75 kV/cm),the anti-ferroelectric PLSZT thin film capacitors exhibited the enhanced energy storage density of 52.6 J/cm^(3) with efficiency of 67.7%under an electric field as high as 2068.9 kV/cm,and the enhanced energy-storage temperature stabilities from room temperature(RT)to more than 200℃ were demonstrated,and the oxygen defects mechanism and size effect were discussed.Moreover,the fast charging(~0.05 μs)and discharging(~0.15 μs)time were certified for the anti-ferroelectric PLSZT film capacitor.These findings broaden the horizon for PLSZT anti-ferroelectrics in high energy storage properties and show promising for manufacturing pulse power capacitor. 展开更多
关键词 PLSZT anti-Ferroelectrics Pulsed laser deposition(pld) Ferroelectric/dielectric properties Energy storage Temperature stability
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Density of states characterization of TiO_(2) films deposited by pulsed laser deposition for heterojunction solar cells
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作者 Daniele Scire Roberto Macaluso +4 位作者 Mauro Mosca Maria Pia Casaletto Olindo Isabella Miro Zeman Isodiana Crupi 《Nano Research》 SCIE EI CSCD 2022年第5期4048-4057,共10页
The application of titanium dioxide(TiO_(2))in the photovoltaic(PV)field is gaining traction as this material can be deployed in doping-free heterojunction solar cells with the role of electron selective contact.For m... The application of titanium dioxide(TiO_(2))in the photovoltaic(PV)field is gaining traction as this material can be deployed in doping-free heterojunction solar cells with the role of electron selective contact.For modeling-based optimization of such contact,knowledge of the titanium oxide defect density of states(DOS)is crucial.In this paper,we report a method to extract the defect density through nondestructive optical measures,including the contribution given by small polaron optical transitions.The presence of both related to oxygen-vacancy defects and polarons is supported by the results of optical characterizations and the evaluation of previous observations resulting in a defect band fixed at 1 eV below the conduction band edge of the oxide.Solar cells employing pulsed laser deposited-TiO_(2)electron selective contacts were fabricated and characterized.The J-V curve of these cells showed,however,an S-shape,then a detailed analysis of the reasons for such behavior was carried out.We use a model involving the series of a standard cell equivalent circuit with a Schottky junction in order to explain these atypical performances.A good matching between the experimental measurements and the adopted theoretical model was obtained.The extracted parameters are listed and analyzed to shed light on the reasons behind the low-performance cells. 展开更多
关键词 solar cell HETEROJUNCTION photovoltaic(PV) defect density small polaron pulsed laser deposition(pld) titanium dioxide(TiO_(2)) defects
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超快脉冲激光沉积类金刚石膜的研究进展 被引量:10
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作者 郭延龙 王小兵 +1 位作者 万强 卢常勇 《激光与光电子学进展》 CSCD 北大核心 2005年第7期22-25,共4页
综述了脉冲沉积(PLD)类金刚石膜(DLC)的优势和局限,对其局限的补偿和突破,以及脉冲沉积法的重要发展方向——超快脉冲激光沉积(Ultra-fast PLD)类金刚石膜(DLC)的研究进展。
关键词 脉冲激光沉积 类金刚石膜 研究进展 发展方向 沉积法 局限
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脉冲激光制备ZnO压敏电阻薄膜 被引量:8
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作者 王豫 安承武 +1 位作者 戴星 白彦东 《压电与声光》 CSCD 北大核心 1996年第5期358-360,F004,共4页
利用脉冲激光沉积技术,在光学玻璃基片上制备了性能良好的ZnO压敏多晶薄膜,其非线性系数α≥6,压敏转折电压约为3.5V。对不同制备条件下沉积样品的XRD分析表明,形成非线性的决定因素是其中存在ZnO相,Zn7Sb2O... 利用脉冲激光沉积技术,在光学玻璃基片上制备了性能良好的ZnO压敏多晶薄膜,其非线性系数α≥6,压敏转折电压约为3.5V。对不同制备条件下沉积样品的XRD分析表明,形成非线性的决定因素是其中存在ZnO相,Zn7Sb2O12尖晶石相及富Bi相,这与体材料的结论一致。我们发现。 展开更多
关键词 压敏电阻 薄膜 脉冲激光沉积 氧化锌
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脉冲激光沉积La_(1/3)(Ca_(2/3)Sr_(1/3))_(2/3)MnO_3薄膜结构及输运特性的研究 被引量:8
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作者 王永仓 陈长乐 +3 位作者 高国棉 陈钊 李润玲 宋宙模 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2005年第12期1854-1856,共3页
采用PLD法在LaAlO_3(012)单晶衬底上外延生长了高、双掺杂La_(1/3)(Ca_(2/3)Sr_(1/3))(2/3)MnO_3(LCSMO)薄膜。薄膜的X射线衍射谱表明,薄膜具有钙钛矿赝立方结构,且具有(012)方向的择优取向;用原子力显微镜对薄膜的表面形貌进行了... 采用PLD法在LaAlO_3(012)单晶衬底上外延生长了高、双掺杂La_(1/3)(Ca_(2/3)Sr_(1/3))(2/3)MnO_3(LCSMO)薄膜。薄膜的X射线衍射谱表明,薄膜具有钙钛矿赝立方结构,且具有(012)方向的择优取向;用原子力显微镜对薄膜的表面形貌进行了分析,发现薄膜表面相对比较平坦;在密封的液氮杜瓦瓶里用四探针法对薄膜的输运特性进行了测试,电阻-温度试验曲线表明,在温度77K~400K的范围内薄膜呈现类半导体特性,没有金属-绝缘体转变温度(T_(Ml))出现;薄膜的红外透射谱在606cm^(-1)处有一个很强的吸收峰,由红外透射谱计算出光学能隙E_(opt)大约为0.7eV,薄膜的光学折射率为1.373。分析认为LCSMO薄膜的类半导体特性是由于A离子半径变化引起晶格畸变造成的。 展开更多
关键词 脉冲激光沉积(pld) LCSMO薄膜 钙钛矿结构
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ZnS薄膜脉冲激光沉积及其发光特性 被引量:9
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作者 纠智先 张兵临 姚宁 《激光技术》 CAS CSCD 北大核心 2004年第6期620-624,共5页
综述了ZnS的发光机制 ,脉冲激光沉积 (PLD)制备薄膜的原理、特点 ,分析了在用PLD制备ZnS过程中各主要沉积条件对成膜质量的影响 ,展望了ZnS薄膜的应用前景。
关键词 脉冲激光沉积 ZNS薄膜 等离子体 纳米材料
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脉冲激光沉积制备c轴取向AlN薄膜 被引量:9
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作者 黄继颇 王连卫 +2 位作者 祝向荣 多新中 林成鲁 《压电与声光》 CSCD 北大核心 1999年第5期387-389,419,共4页
c轴取向的AlN 具有优异的压电性和声表面波传输特性,已受到人们日益广泛的重视。文章报道了采用KrF脉冲准分子激光沉积工艺,在Si(100)衬底上成功地制备了c轴取向的AlN晶态薄膜。X射线衍射与傅里叶变换红外光谱的... c轴取向的AlN 具有优异的压电性和声表面波传输特性,已受到人们日益广泛的重视。文章报道了采用KrF脉冲准分子激光沉积工艺,在Si(100)衬底上成功地制备了c轴取向的AlN晶态薄膜。X射线衍射与傅里叶变换红外光谱的结果表明,在300 °C~800 °C衬底温度下,薄膜均只有(002)一个衍射峰,但随着温度的升高,薄膜的结晶质量变好;原子力显微镜对800 °C沉积薄膜观察结果显示,薄膜具有高度一致的柱状结构,平均晶粒大小为250 nm 。 展开更多
关键词 氮化铝 脉冲激光沉积 压电性 半导体薄膜技术
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脉冲激光沉积制备ZnO薄膜及其发光性质研究 被引量:9
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作者 王璟璟 李清山 +4 位作者 陈达 孔祥贵 郑学刚 张宁 赵波 《光电子.激光》 EI CAS CSCD 北大核心 2006年第9期1065-1068,共4页
采用脉冲激光沉积(PLD)技术,在Si(100)衬底上制备出高度c轴取向的ZnO薄膜。通过测量X射线衍射(XRD)谱、扫描电镜(SEM)和光致发光(PL)谱,研究了衬底温度改变对薄膜结构和PL的影响。实验结果表明,当衬底温度从400℃升到700℃时,薄膜的(002... 采用脉冲激光沉积(PLD)技术,在Si(100)衬底上制备出高度c轴取向的ZnO薄膜。通过测量X射线衍射(XRD)谱、扫描电镜(SEM)和光致发光(PL)谱,研究了衬底温度改变对薄膜结构和PL的影响。实验结果表明,当衬底温度从400℃升到700℃时,薄膜的(002)衍射峰半高宽(FWHM)变窄,紫外(UV)发光强度在衬底温度为500℃达到最强。这可能是当衬底温度为500℃时,ZnO薄膜的化学配比较好,说明化学配比对UV发光的影响要大于薄膜微结构的影响。改变衬底温度对薄膜的表面形貌也有较大的影响。 展开更多
关键词 ZnO 光致发光(PL) 半高宽(FWHM) 脉冲激光沉积(pld)
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脉冲准分子激光PZT薄膜的制备 被引量:4
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作者 陈逸清 郑立荣 +1 位作者 林成鲁 邹世昌 《中国激光》 EI CAS CSCD 北大核心 1994年第8期631-634,共4页
本实验采用脉冲准分子激光沉积(PLD)法,在193nm波长,5Hz频率,4J/cm2能量密度条件下,分别在Si(100)和SiO2/Si衬底上成功地沉积Pb(Zr,Ti)O3(PZT)薄膜,并在不同的条件下对PZT薄... 本实验采用脉冲准分子激光沉积(PLD)法,在193nm波长,5Hz频率,4J/cm2能量密度条件下,分别在Si(100)和SiO2/Si衬底上成功地沉积Pb(Zr,Ti)O3(PZT)薄膜,并在不同的条件下对PZT薄膜进行退火处理。用XRD,RBS,ASR等方法分别测量了薄膜的结构、组份和厚度。 展开更多
关键词 PZT 铁电薄膜 准分子 激光沉积
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激光在硅基底沉积类金刚石膜的光学应用 被引量:8
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作者 程勇 郭延龙 +3 位作者 王淑云 米朝伟 丁方正 万强 《红外与激光工程》 EI CSCD 北大核心 2010年第5期875-878,共4页
研究了氧气氛和掺硅对类金刚石(DLC)膜性能的影响机理。采用飞秒激光烧蚀石墨靶材,通过氧气氛、掺硅和离轴平移旋转等技术,在硅基底上镀制出比传统工艺透过率、硬度、附着力和稳定性等性能更优的无氢DLC膜。实验验证了随着氧气氛压强... 研究了氧气氛和掺硅对类金刚石(DLC)膜性能的影响机理。采用飞秒激光烧蚀石墨靶材,通过氧气氛、掺硅和离轴平移旋转等技术,在硅基底上镀制出比传统工艺透过率、硬度、附着力和稳定性等性能更优的无氢DLC膜。实验验证了随着氧气氛压强的增大,样片透过率先增大后减小,存在一个最佳气压(2 Pa)。并且掺硅有助于改善DLC膜的性能,掺硅量也存在一个最佳值。在3-5μm波段,正面镀DLC膜、背面镀普通增透膜的硅红外窗口的平均透过率≥91.7%,DLC膜的纳米硬度高达40-50 GPa,且通过军标规定的高温、低温、湿热、盐雾、重摩擦等环境实验,满足光学窗口工程应用的要求。 展开更多
关键词 激光沉积 类金刚石膜 硅基底 光学应用
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PLD法生长高质量ZnO薄膜及其光电导特性研究 被引量:2
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作者 边继明 李效民 +1 位作者 赵俊亮 于伟东 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2006年第3期701-706,共6页
采用脉冲激光沉积(PLD)法在单晶Si(100)衬底上生长ZnO薄膜,以X射线衍射 (XRD)和场发射扫描电镜(SEM)等手段分析了所得ZnO薄膜的晶体结构和微观形貌.结果表明,随着衬底温度和薄膜生长时氧分压的增加, ZnO薄膜的晶体结构和化学计量比得... 采用脉冲激光沉积(PLD)法在单晶Si(100)衬底上生长ZnO薄膜,以X射线衍射 (XRD)和场发射扫描电镜(SEM)等手段分析了所得ZnO薄膜的晶体结构和微观形貌.结果表明,随着衬底温度和薄膜生长时氧分压的增加, ZnO薄膜的晶体结构和化学计量比得到显著改善.优化工艺(700℃,20Pa)下生长的ZnO薄膜呈c轴高度择优取向,柱状晶垂直衬底表面生长,结构致密均匀.以不同暗电阻的ZnO薄膜为材料,利用剥离(lift-off)技术制备了MSM 结构ZnO光电导型紫外探测器.紫外光照射前后的I—V特性测试表明ZnO薄膜产生非常明显的光电导现象,分析了其光电响应机理. 展开更多
关键词 ZNO薄膜 脉冲激光沉积 光电导紫外探测器 光电响应机理
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脉冲准分子激光制备PCLT热释电薄膜 被引量:4
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作者 郑立荣 杨平雄 +1 位作者 林成鲁 邹世昌 《中国激光》 EI CAS CSCD 北大核心 1998年第5期473-476,共4页
采用脉冲激光沉积的方法,在Pt/SiO_2/Si衬底上制备了掺Ca的(Pb,La)TiO_3薄膜。薄膜呈多晶结构,具有较好的铁电性和热释电性。由于掺Ca的作用,使薄膜的材料探测优值和电压响应优值几乎与单晶MgO衬底上的c轴取向的PbTiO_3或(Ph,La)TiO_3... 采用脉冲激光沉积的方法,在Pt/SiO_2/Si衬底上制备了掺Ca的(Pb,La)TiO_3薄膜。薄膜呈多晶结构,具有较好的铁电性和热释电性。由于掺Ca的作用,使薄膜的材料探测优值和电压响应优值几乎与单晶MgO衬底上的c轴取向的PbTiO_3或(Ph,La)TiO_3薄膜相比拟。这些较好的实验结果是在硅基衬底上的铁电薄膜中获得的,因而对研制单片集成的红外热释电阵列将有一定的意义。 展开更多
关键词 PCLT 脉冲激光沉积 铁电薄膜 热释电
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沉积温度对制备ZnS薄膜的影响 被引量:5
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作者 纠智先 李强 《武汉工业学院学报》 CAS 2008年第2期90-92,共3页
采用YAG固体激光器(1064nm)和XeCl(308nm)准分子激光器,利用射频辅助脉冲激光沉积技术,研究了在不同沉积温度下对制备ZnS薄膜的影响。利用X射线衍射(XRD)和扫描电子显微镜(SEM)对制备样品的结构、形貌特性进行了表征。结果表明:沉积温... 采用YAG固体激光器(1064nm)和XeCl(308nm)准分子激光器,利用射频辅助脉冲激光沉积技术,研究了在不同沉积温度下对制备ZnS薄膜的影响。利用X射线衍射(XRD)和扫描电子显微镜(SEM)对制备样品的结构、形貌特性进行了表征。结果表明:沉积温度和射频辅助密切相关,射频辅助更有利于低温下制膜。 展开更多
关键词 脉冲激光沉积 ZNS薄膜 沉积温度 射频
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ZnS薄膜生长温度对ZnS/PS体系结构和发光的影响 被引量:5
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作者 王彩凤 李清山 郑萌萌 《光电子.激光》 EI CAS CSCD 北大核心 2008年第4期490-492,共3页
用电化学阳极氧化法制备了一定孔隙率的多孔硅(PS,PorousSilicon)样品,然后以PS为衬底用脉冲激光沉积(PLD)的方法在100℃、200℃和300℃下生长ZnS薄膜。X射线衍射(XRD)结果表明,样品都在28.5°附近有一个较强的衍射峰,对应于β-ZnS(... 用电化学阳极氧化法制备了一定孔隙率的多孔硅(PS,PorousSilicon)样品,然后以PS为衬底用脉冲激光沉积(PLD)的方法在100℃、200℃和300℃下生长ZnS薄膜。X射线衍射(XRD)结果表明,样品都在28.5°附近有一个较强的衍射峰,对应于β-ZnS(111)晶向,说明薄膜沿该方向择优取向生长,但由于衬底PS粗糙的表面结构,衍射峰的半高全宽(FWHM)较大。随着ZnS薄膜生长温度的升高,薄膜的衍射峰强度逐渐增强。扫描电子显微镜(SEM)像显示,随着薄膜生长温度的升高,构成薄膜的纳米晶粒生长变大。室温下的光致发光(PL)谱表明,随着薄膜生长温度的升高,ZnS的发光强度增强而PS的发光强度减弱,把ZnS的蓝绿光与PS的红光叠加,在可见光区450~700nm形成了一个较宽的光致发光谱带,呈现较强的白光发射。 展开更多
关键词 光致发光(PL) 白光 脉冲激光沉积(pld) ZnS多孔硅(PS)
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NaF薄膜的脉冲激光沉积法制备与结构研究 被引量:3
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作者 詹勇军 吴卫东 +3 位作者 王锋 白黎 唐永建 谌家军 《强激光与粒子束》 EI CAS CSCD 北大核心 2007年第4期633-637,共5页
采用脉冲激光沉积(PLD)方法在Si(100)衬底上制备了NaF薄膜。在激光重复频率2 Hz,能量密度3 J/cm2,本底真空度5×10-5Pa的条件下,研究衬底温度对薄膜沉积速率及结构的影响。台阶仪分析表明:薄膜的沉积速率随衬底温度增加呈指数函数增... 采用脉冲激光沉积(PLD)方法在Si(100)衬底上制备了NaF薄膜。在激光重复频率2 Hz,能量密度3 J/cm2,本底真空度5×10-5Pa的条件下,研究衬底温度对薄膜沉积速率及结构的影响。台阶仪分析表明:薄膜的沉积速率随衬底温度增加呈指数函数增加,算出NaF薄膜的反应激活能为48.67 kJ/mol。原子力显微镜分析表明:薄膜致密而光滑,均方根粗糙度为0.553 nm。扫描电镜截面微观形貌分析表明:薄膜呈现柱状结构。X射线衍射分析表明:NaF薄膜为面心立方晶体结构,并具有显著的择优取向;当衬底温度约为400℃时,平均晶粒尺寸最大(129.6 nm),晶格微应变最小(0.225%)。 展开更多
关键词 脉冲激光沉积(pld) NaF薄膜 ICF靶 面心立方结构 反应激活能
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脉冲激光沉积制备Ge纳米薄膜的研究 被引量:6
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作者 程成 薛催岭 宋仁国 《光电子.激光》 EI CAS CSCD 北大核心 2009年第2期204-207,共4页
利用脉冲激光沉积(PLD)技术,在Ar环境下于Si基片上制备出Ge纳米薄膜。用X射线衍射(XRD)仪和原子力显微镜(AFM)观测了薄膜的微观结构和形貌,分析了它们随激光能量密度和衬底温度的变化情况。结果表明:Ge薄膜在室温下即可以结晶,其平均晶... 利用脉冲激光沉积(PLD)技术,在Ar环境下于Si基片上制备出Ge纳米薄膜。用X射线衍射(XRD)仪和原子力显微镜(AFM)观测了薄膜的微观结构和形貌,分析了它们随激光能量密度和衬底温度的变化情况。结果表明:Ge薄膜在室温下即可以结晶,其平均晶粒尺寸随脉冲激光能量密度的增大而增大。当脉冲激光能量密度为0.94 J/cm2时,所制备的薄膜由约13 nm的颗粒组成;当脉冲激光能量密度增大为1.31 J/cm2时,颗粒的平均尺寸增大为56 nm,且薄膜表面变得比较均匀。此外,当衬底温度从室温升到450℃过程中,晶粒平均尺寸随温度升高而增大。在实验基础上,对薄膜的生长机理进行了分析。 展开更多
关键词 脉冲激光沉积 Ge 纳米薄膜 微观结构 生长机理
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