Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manip...Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manipulating electron beam（EB）to jump between two different evaporation sources alternately with variable frequencies（jumping beam technology）.The plasma activation was generated by a hollow cathode plasma unit.The deposition process was demonstrated by means of tailoring TiN/TiAlN multilayers with different modulation periods（M1：26.5 nm,M2：80.0 nm,M3：6.0 nm,M4：4.0 nm）.The microstructure and hardness of the multilayer coatings were comparatively studied with TiN and TiAlN singlelayer coatings.The columnar structure of the coatings（TiN,TiAlN,M1,M2）is replaced by a glassy-like microstructure when the modulation period decreases to less than 10 nm（M3,M4）.Simultaneously,superlattice growth occurs.With the decrease of modulation period,both the hardness and the plastic deformation resistance（H^3/E^2,H-hardness and E-elastic modulus）increase.M4coating exhibits the maximum hardness of（49.6±2.7）GPa and the maximum plastic deformation resistance of^0.74 GPa.展开更多
VAlN coating is of particular interest for dry cutting applications owing to its low-friction and excellent abrasiveness.Nano-multilayer structure is designed to tailor the properties of VAlN coating.In this work,a se...VAlN coating is of particular interest for dry cutting applications owing to its low-friction and excellent abrasiveness.Nano-multilayer structure is designed to tailor the properties of VAlN coating.In this work,a series of VAlN/Si_(3)N_(4) nano-multilayer coatings with varied Si_(3)N_(4) layer thicknesses were prepared by reactive sputtering method.The microstructure and mechanical properties of the coatings were both investigated.It is revealed that Si_(3)N_(4) with a shallow thickness(~0.4 nm)was crystallized and grown coherently with VAlN,showing a remarkable increase in hardness compared to VAlN monolayer coating.The hardness of coherently VAlN/Si_(3)N_(4) nano-multilayer coatings reached to 48.7 GPa.With further increase of Si_(3)N_(4) layer thickness,the coherent growth of nano-multilayers was terminated,showing amorphous structure formed in nano-multilayers and the hardness was declined.On the other hand,when Si_(3)N_(4) layer thickness was 0.4 nm,the friction coefficient of VAlN/Si_(3)N_(4) nano-multilayer coating was almost equal to that of VAlN monolayer coating,which was attributed to the crystallization of Si_(3)N_(4) and the produced coherent interfaces between VAlN and Si_(3)N_(4) for the hardening effect of nano-multilayer coatings.Upon further increase of Si_(3)N_(4) layer thickness,pronounced improvement of friction coefficient in VAlN/Si_(3)N_(4) nano-multilayer coating was observed.展开更多
基金financially supported by the National Natural Science Foundations of China(Nos.51201005 and 51231001)
文摘Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manipulating electron beam（EB）to jump between two different evaporation sources alternately with variable frequencies（jumping beam technology）.The plasma activation was generated by a hollow cathode plasma unit.The deposition process was demonstrated by means of tailoring TiN/TiAlN multilayers with different modulation periods（M1：26.5 nm,M2：80.0 nm,M3：6.0 nm,M4：4.0 nm）.The microstructure and hardness of the multilayer coatings were comparatively studied with TiN and TiAlN singlelayer coatings.The columnar structure of the coatings（TiN,TiAlN,M1,M2）is replaced by a glassy-like microstructure when the modulation period decreases to less than 10 nm（M3,M4）.Simultaneously,superlattice growth occurs.With the decrease of modulation period,both the hardness and the plastic deformation resistance（H^3/E^2,H-hardness and E-elastic modulus）increase.M4coating exhibits the maximum hardness of（49.6±2.7）GPa and the maximum plastic deformation resistance of^0.74 GPa.
基金Project(51201187)supported by the National Natural Science Foundation of China。
文摘VAlN coating is of particular interest for dry cutting applications owing to its low-friction and excellent abrasiveness.Nano-multilayer structure is designed to tailor the properties of VAlN coating.In this work,a series of VAlN/Si_(3)N_(4) nano-multilayer coatings with varied Si_(3)N_(4) layer thicknesses were prepared by reactive sputtering method.The microstructure and mechanical properties of the coatings were both investigated.It is revealed that Si_(3)N_(4) with a shallow thickness(~0.4 nm)was crystallized and grown coherently with VAlN,showing a remarkable increase in hardness compared to VAlN monolayer coating.The hardness of coherently VAlN/Si_(3)N_(4) nano-multilayer coatings reached to 48.7 GPa.With further increase of Si_(3)N_(4) layer thickness,the coherent growth of nano-multilayers was terminated,showing amorphous structure formed in nano-multilayers and the hardness was declined.On the other hand,when Si_(3)N_(4) layer thickness was 0.4 nm,the friction coefficient of VAlN/Si_(3)N_(4) nano-multilayer coating was almost equal to that of VAlN monolayer coating,which was attributed to the crystallization of Si_(3)N_(4) and the produced coherent interfaces between VAlN and Si_(3)N_(4) for the hardening effect of nano-multilayer coatings.Upon further increase of Si_(3)N_(4) layer thickness,pronounced improvement of friction coefficient in VAlN/Si_(3)N_(4) nano-multilayer coating was observed.
