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MoS_x/MoS_x-Mo纳米多层膜的制备及其环境摩擦学特性 被引量:2
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作者 郑晓华 居易 +3 位作者 沈霞 王运 涂江平 何丹农 《润滑与密封》 EI CAS CSCD 北大核心 2006年第7期84-86,共3页
用直流磁控溅射在钢基体上交替溅射制备了MoSx/MoSx-Mo纳米多层膜。采用划痕仪测试薄膜与基体的结合力;采用SEM和XRD分析了纳米多层膜的形貌和显微结构;在球-盘式微摩擦试验机上测试了纳米多层膜在真空和潮湿空气中的摩擦学性能。结果表... 用直流磁控溅射在钢基体上交替溅射制备了MoSx/MoSx-Mo纳米多层膜。采用划痕仪测试薄膜与基体的结合力;采用SEM和XRD分析了纳米多层膜的形貌和显微结构;在球-盘式微摩擦试验机上测试了纳米多层膜在真空和潮湿空气中的摩擦学性能。结果表明,纳米多层膜的结合力优于纯MoS2膜。随着溅射沉积气压的升高,MoSx(002)面择优取向减弱,纳米多层膜的结合力下降。溅射气压0.24 Pa沉积的纳米多层膜在真空和潮湿空气中都呈现出最低的摩擦因数和磨损率,具有优异的环境摩擦磨损特性。 展开更多
关键词 mosx薄膜 磁控溅射 多层膜 沉积压力 环境
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MoS_x FILMS DEPOSITED ON DIFFERENT MATRIXES BY ION BEAM TECHNIQUE
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作者 王培禄 刘仲阳 +2 位作者 姜景云 苟富均 杨兴富 《Nuclear Science and Techniques》 SCIE CAS CSCD 1995年第3期178-182,共5页
MoSx (x = 1.79  ̄ 2.34) films of 200 nm thickness are deposited onto brass and C20 steel substrates by the ion beam assisted technique, respectively. Structures and compositions of these films, and changes in valence ... MoSx (x = 1.79  ̄ 2.34) films of 200 nm thickness are deposited onto brass and C20 steel substrates by the ion beam assisted technique, respectively. Structures and compositions of these films, and changes in valence states of the Mo element are examined by XRD and XPS before and after wear. The lubrication properties and wear resistances for two kinds of samples are evaluated using a pin-on-disk installation in atmosphere at the room temperature. Tribo-wear behaviours and the microstructures between two kinds of samples exhibit obvious differences. 展开更多
关键词 Molybdenum disulphide Ion beam assisted deposition FRICTION WEAR
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