Ga doped ZnO （GZO）/Cu grid double layer structures were prepared at room temperature （RT）. We have studied the electrical and optical characteristics of the GZO/Cu grid double layer as a function of the Cu grid sp...Ga doped ZnO （GZO）/Cu grid double layer structures were prepared at room temperature （RT）. We have studied the electrical and optical characteristics of the GZO/Cu grid double layer as a function of the Cu grid spacing distance. The optical transmittance and sheet resistance of the GZO/Cu grid double layer are higher than that of the GZO/Cu film double layer regardless of the Cu grid spacing distance and increase as the Cu grid spacing distance increases. The calculated values for the transmittance and sheet resistance of the GZO/Cu grid double layer well follow the trend of the experimentally observed transmittance and sheet resistance ones. For the GZO/Cu grid double layer with a Cu grid spacing distance of 1 mm, the highest figure of merit （ФTC = 6.19 × 10^-3 Ω^-1） was obtained. In this case, the transmittance, resistivity and filling factor （FF） of the GZO/Cu grid double layer are 83.74%, 1.10 ×10^-4Ω.cm and 0.173, respectively.展开更多
Ga doped ZnO （OZO）/Cu grid/GZO transparent conductive electrode （TCE） structures were fabricated at room temperature （RT） by using electron beam evaporation （EBE） for the Cu grids and RF magnetron sputtering f...Ga doped ZnO （OZO）/Cu grid/GZO transparent conductive electrode （TCE） structures were fabricated at room temperature （RT） by using electron beam evaporation （EBE） for the Cu grids and RF magnetron sputtering for the GZO layers. In this work, we investigated the electrical and optical characteristics of GZO/Cu grid/GZO multilayer electrode for thin film solar cells by using evaporated Cu grid and sputtered GZO thin films to enhance the optical transparency without significantly affecting their conductivity. The optical transmittance and sheet resistance of GZO/Cu grid/GZO multilayer are higher than those of GZO/Cu film/GZO multilayer independent of Cu grid separation distance and increase with increasing Cu grid separation distances. The calculation of both transmittance and sheet resistance of GZO/Cu grid] GZO multilayer was based on Cu filling factor correlated with the geometry of Cu grid. The calculated values for the transmittance and sheet resistance of the GZO/Cu grid/GZO multilayer were similar to the experimentally observed ones. The highest figure of merit ФTc is 5.18× 10^-3Ω^-1 for the GZO/Cu grid] GZO multilayer with Cu grid separation distance of 1 mm was obtained, in this case, the transmittance and resistivity were 82.72% and 2.17 × 10 ^-4Ωcm, respectively. The transmittance and resistivity are accentahle for nractical thin film snlar cell annlicatinn~展开更多
C-axis oriented Ga-doped ZnO(GZO) films with various thicknesses were deposited on glass substrate by radio frequency(RF) magnetron sputtering. The dependence of crystal structure,electrical,and optical properties of ...C-axis oriented Ga-doped ZnO(GZO) films with various thicknesses were deposited on glass substrate by radio frequency(RF) magnetron sputtering. The dependence of crystal structure,electrical,and optical properties of the GZO films on crystalline size were systematically studied. The results showed that the texture coefficient of (002) peak (TC(002)) decreases with increasing crystalline size. The Hall mobility m was reciprocal to electron effective mass and the fitted relaxation time s was 0.11±0.01 ms. With the increase of average crystalline size,the resistivity increased slightly,which is caused by the competition of (002) and(101) plane,introducing in some defects and leading to carrier density reduction. The optical band gap was in the range from 3.454 to 3.319 eV with increasing crystalline size from 26.96 to 30.88 nm,showing a negative relationship. The dependence of optical band gap (Eopg) on the crystalline size(R) can be qualitatively explained by a quantum confinement effect. The relationship between Eopg and R of GZO films suggests that tuning up optical properties for desired applications can be achieved by controlling the crystalline size.展开更多
A photoanode with Ga-doped ZnO nanorods has been prepared on F-doped SnO2 (FTO) coated glass substrate and its application in dye-sensitized solar cells (DSSCs) has been investigated. Ga-doped ZnO nanorods have been s...A photoanode with Ga-doped ZnO nanorods has been prepared on F-doped SnO2 (FTO) coated glass substrate and its application in dye-sensitized solar cells (DSSCs) has been investigated. Ga-doped ZnO nanorods have been synthesized by an electric-field-assisted wet chemical approach at 80?C. Under a direct current electric field, the nanorods predominantly grow on cathodes. The results of the X-ray photoelectron spectroscopy and photoluminescence verify that Ga dopant is successfully incorporated into the ZnO wurtzite lattice structure. Finally, employing Ga-doped ZnO nanorods with the length of ~5 μm as the photoanode of DSSCs, an overall energy conversion efficiency of 2.56% is achieved. The dramatically improved performance of Ga-doped ZnO based DSSCs compared with that of pure ZnO is due to the higher electron conductivity.展开更多
An 8μm thick Ga-doped ZnO（GZO） film grown by metal-source vapor phase epitaxy was deposited on a GaN-based light-emitting diode（LED） to substitute for the conventional ITO as a transparent conduct layer（TCL）. E...An 8μm thick Ga-doped ZnO（GZO） film grown by metal-source vapor phase epitaxy was deposited on a GaN-based light-emitting diode（LED） to substitute for the conventional ITO as a transparent conduct layer（TCL）. Electroluminescence spectra exhibited that the intensity value of LED emission with a GZO TCL is markedly improved by 23.6%as compared to an LED with an ITO TCL at 20 mA.In addition,the forward voltage of the LED with a GZO TCL at 20 mA is higher than that of the conventional LED.To investigate the reason for the increase of the forward voltage,X-ray photoelectron spectroscopy was performed to analyze the interface properties of the GZO/p-GaN heterojunction.The large valence band offset（2.24±0.21 eV） resulting from the formation of Ga_2O_3 in the GZO/p-GaN interface was attributed to the increase of the forward voltage.展开更多
基金supported by the Key Project of the National Natural Science Foundation of China(No.91333203)the Program for Innovative Research Team in University of Ministry of Education of China(No.IRT13037)+1 种基金the National Natural Science Foundation of China(No.51172204)the Zhejiang Provincial Department of Science and Technology of China(No.2010R50020)
文摘Ga doped ZnO （GZO）/Cu grid double layer structures were prepared at room temperature （RT）. We have studied the electrical and optical characteristics of the GZO/Cu grid double layer as a function of the Cu grid spacing distance. The optical transmittance and sheet resistance of the GZO/Cu grid double layer are higher than that of the GZO/Cu film double layer regardless of the Cu grid spacing distance and increase as the Cu grid spacing distance increases. The calculated values for the transmittance and sheet resistance of the GZO/Cu grid double layer well follow the trend of the experimentally observed transmittance and sheet resistance ones. For the GZO/Cu grid double layer with a Cu grid spacing distance of 1 mm, the highest figure of merit （ФTC = 6.19 × 10^-3 Ω^-1） was obtained. In this case, the transmittance, resistivity and filling factor （FF） of the GZO/Cu grid double layer are 83.74%, 1.10 ×10^-4Ω.cm and 0.173, respectively.
基金support of the key project of the National Natural Science Foundation of China under Grant Nos.91333203 and 51172204the Program for Innovative Research Team in University of Ministry of Education of China under Grant No.IRT13037the Zhejiang Provincial Department of Science and Technology of China under Grant No.2010R50020
文摘Ga doped ZnO （OZO）/Cu grid/GZO transparent conductive electrode （TCE） structures were fabricated at room temperature （RT） by using electron beam evaporation （EBE） for the Cu grids and RF magnetron sputtering for the GZO layers. In this work, we investigated the electrical and optical characteristics of GZO/Cu grid/GZO multilayer electrode for thin film solar cells by using evaporated Cu grid and sputtered GZO thin films to enhance the optical transparency without significantly affecting their conductivity. The optical transmittance and sheet resistance of GZO/Cu grid/GZO multilayer are higher than those of GZO/Cu film/GZO multilayer independent of Cu grid separation distance and increase with increasing Cu grid separation distances. The calculation of both transmittance and sheet resistance of GZO/Cu grid] GZO multilayer was based on Cu filling factor correlated with the geometry of Cu grid. The calculated values for the transmittance and sheet resistance of the GZO/Cu grid/GZO multilayer were similar to the experimentally observed ones. The highest figure of merit ФTc is 5.18× 10^-3Ω^-1 for the GZO/Cu grid] GZO multilayer with Cu grid separation distance of 1 mm was obtained, in this case, the transmittance and resistivity were 82.72% and 2.17 × 10 ^-4Ωcm, respectively. The transmittance and resistivity are accentahle for nractical thin film snlar cell annlicatinn~
基金supported by the National Natural Science Foundation of China (No.51071038)Sichuan Province Science Foundation for Youths (No.2010JQ0002)State Key Laboratory for Mechanical Behavior of Materials,Xi’an Jiaotong University,China (No.20131309)
文摘C-axis oriented Ga-doped ZnO(GZO) films with various thicknesses were deposited on glass substrate by radio frequency(RF) magnetron sputtering. The dependence of crystal structure,electrical,and optical properties of the GZO films on crystalline size were systematically studied. The results showed that the texture coefficient of (002) peak (TC(002)) decreases with increasing crystalline size. The Hall mobility m was reciprocal to electron effective mass and the fitted relaxation time s was 0.11±0.01 ms. With the increase of average crystalline size,the resistivity increased slightly,which is caused by the competition of (002) and(101) plane,introducing in some defects and leading to carrier density reduction. The optical band gap was in the range from 3.454 to 3.319 eV with increasing crystalline size from 26.96 to 30.88 nm,showing a negative relationship. The dependence of optical band gap (Eopg) on the crystalline size(R) can be qualitatively explained by a quantum confinement effect. The relationship between Eopg and R of GZO films suggests that tuning up optical properties for desired applications can be achieved by controlling the crystalline size.
文摘A photoanode with Ga-doped ZnO nanorods has been prepared on F-doped SnO2 (FTO) coated glass substrate and its application in dye-sensitized solar cells (DSSCs) has been investigated. Ga-doped ZnO nanorods have been synthesized by an electric-field-assisted wet chemical approach at 80?C. Under a direct current electric field, the nanorods predominantly grow on cathodes. The results of the X-ray photoelectron spectroscopy and photoluminescence verify that Ga dopant is successfully incorporated into the ZnO wurtzite lattice structure. Finally, employing Ga-doped ZnO nanorods with the length of ~5 μm as the photoanode of DSSCs, an overall energy conversion efficiency of 2.56% is achieved. The dramatically improved performance of Ga-doped ZnO based DSSCs compared with that of pure ZnO is due to the higher electron conductivity.
文摘An 8μm thick Ga-doped ZnO（GZO） film grown by metal-source vapor phase epitaxy was deposited on a GaN-based light-emitting diode（LED） to substitute for the conventional ITO as a transparent conduct layer（TCL）. Electroluminescence spectra exhibited that the intensity value of LED emission with a GZO TCL is markedly improved by 23.6%as compared to an LED with an ITO TCL at 20 mA.In addition,the forward voltage of the LED with a GZO TCL at 20 mA is higher than that of the conventional LED.To investigate the reason for the increase of the forward voltage,X-ray photoelectron spectroscopy was performed to analyze the interface properties of the GZO/p-GaN heterojunction.The large valence band offset（2.24±0.21 eV） resulting from the formation of Ga_2O_3 in the GZO/p-GaN interface was attributed to the increase of the forward voltage.
