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Fabrication of CuO_x thin-film photocathodes by magnetron reactive sputtering for photoelectrochemical water reduction
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作者 Tian Xie Tao Zheng +2 位作者 Ruiling Wang Yuyu Bu Jin-Ping Ao 《Green Energy & Environment》 SCIE 2018年第3期239-246,共8页
The CuO_x thin film photocathodes were deposited on F-doped Sn O_2 (FTO)transparent conducting glasses by alternating current(AC)magnetron reactive sputtering under different Ar:O_2 ratios.The advantage of this deposi... The CuO_x thin film photocathodes were deposited on F-doped Sn O_2 (FTO)transparent conducting glasses by alternating current(AC)magnetron reactive sputtering under different Ar:O_2 ratios.The advantage of this deposited method is that it can deposit a CuO_x thin film uniformly and rapidly with large scale.From the photoelectrochemical(PEC)properties of these CuO_x photocathodes,it can be found that the CuO_x photocathode with Ar/O_2 30:7 provide a photocurrent density ofà3.2 m A cm^(à2)under a bias potentialà0.5 V(vs.Ag/Ag Cl),which was found to be twice higher than that of Ar/O_2 with 30:5.A detailed characterization on the structure,morphology and electrochemical properties of these CuO_x thin film photocathodes was carried out,and it is found that the improved PEC performance of CuO_x semiconductor photocathode with Ar/O_230:7 attributed to the less defects in it,indicating that this Ar/O_230:7 is an optimized condition for excellent CuO_x semiconductor photocathode fabrication. 展开更多
关键词 cuox thin film Magnetron sputtering PHOTOCATHODE Defect controlling
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