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Fabrication of CuO_x thin-film photocathodes by magnetron reactive sputtering for photoelectrochemical water reduction

Fabrication of CuO_x thin-film photocathodes by magnetron reactive sputtering for photoelectrochemical water reduction
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摘要 The CuO_x thin film photocathodes were deposited on F-doped Sn O_2 (FTO)transparent conducting glasses by alternating current(AC)magnetron reactive sputtering under different Ar:O_2 ratios.The advantage of this deposited method is that it can deposit a CuO_x thin film uniformly and rapidly with large scale.From the photoelectrochemical(PEC)properties of these CuO_x photocathodes,it can be found that the CuO_x photocathode with Ar/O_2 30:7 provide a photocurrent density ofà3.2 m A cm^(à2)under a bias potentialà0.5 V(vs.Ag/Ag Cl),which was found to be twice higher than that of Ar/O_2 with 30:5.A detailed characterization on the structure,morphology and electrochemical properties of these CuO_x thin film photocathodes was carried out,and it is found that the improved PEC performance of CuO_x semiconductor photocathode with Ar/O_230:7 attributed to the less defects in it,indicating that this Ar/O_230:7 is an optimized condition for excellent CuO_x semiconductor photocathode fabrication. The CuO_x thin film photocathodes were deposited on F-doped Sn O_2 (FTO)transparent conducting glasses by alternating current(AC)magnetron reactive sputtering under different Ar:O_2 ratios.The advantage of this deposited method is that it can deposit a CuO_x thin film uniformly and rapidly with large scale.From the photoelectrochemical(PEC)properties of these CuO_x photocathodes,it can be found that the CuO_x photocathode with Ar/O_2 30:7 provide a photocurrent density ofà3.2 m A cm^(à2)under a bias potentialà0.5 V(vs.Ag/Ag Cl),which was found to be twice higher than that of Ar/O_2 with 30:5.A detailed characterization on the structure,morphology and electrochemical properties of these CuO_x thin film photocathodes was carried out,and it is found that the improved PEC performance of CuO_x semiconductor photocathode with Ar/O_230:7 attributed to the less defects in it,indicating that this Ar/O_230:7 is an optimized condition for excellent CuO_x semiconductor photocathode fabrication.
出处 《Green Energy & Environment》 SCIE 2018年第3期239-246,共8页 绿色能源与环境(英文版)
基金 financially supported by the National Natural Science Foundation of China (Grant Nos. 41506093)
关键词 CuOx thin film Magnetron sputtering PHOTOCATHODE Defect controlling CuOx thin film Magnetron sputtering Photocathode Defect controlling
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