采用反应型紫外吸收剂UV-SUN CEL LIQ对天丝织物进行抗紫外整理,探讨了纯碱质量浓度、氯化钠质量浓度以及整理温度、时间和紫外吸收剂质量浓度对抗紫外效果的影响,测试了整理织物的耐水洗性能。结果表明,整理天丝织物的抗紫外性能随着...采用反应型紫外吸收剂UV-SUN CEL LIQ对天丝织物进行抗紫外整理,探讨了纯碱质量浓度、氯化钠质量浓度以及整理温度、时间和紫外吸收剂质量浓度对抗紫外效果的影响,测试了整理织物的耐水洗性能。结果表明,整理天丝织物的抗紫外性能随着整理时间的延长和氯化钠质量浓度的增加而逐渐升高,随着染色温度的升高和纯碱质量浓度的提高,天丝织物的UPF指数先升高后降低,当紫外吸收剂质量浓度为1%（omf）时对天丝织物的较佳整理工艺：纯碱质量浓度4 g/L、氯化钠质量浓度50 g/L、整理温度60~80℃,保温60 min,整理后天丝织物的UPF指数符合标准要求,且具有较好的耐洗性,整理织物经30次标准洗涤后UPF指数基本保持不变。展开更多
Our previous study reported the influences of different complexing agents on electroless nickel （EN） by examining the properties of the deposits. In the present work, the effects of four common-used complexing agent...Our previous study reported the influences of different complexing agents on electroless nickel （EN） by examining the properties of the deposits. In the present work, the effects of four common-used complexing agents on EN deposition rate and the stability of solution pH values were examined, either with an acetic pH buffer agent or absent of them. It is indicated that the pH buffeting effect of them is dominative when the EN solution is lack of the pH buffer. Under this situation, the EN deposition rate increases with the concentration of complexing agents increasing. The EN deposition rate decreases with fin＇ther adding the complexing agent when the solution already has enough pH buffer capability. Electrochemical impedance spectroscopy obtained during EN deposition illustrates that, in this case, the enhanced reaction resistance is the main reason for a lower deposition rate. However, the influence of polarization caused by mass transfer is not negligible at high complex ratio for sodium citrate and malic acid EN solutions.展开更多
文摘Our previous study reported the influences of different complexing agents on electroless nickel （EN） by examining the properties of the deposits. In the present work, the effects of four common-used complexing agents on EN deposition rate and the stability of solution pH values were examined, either with an acetic pH buffer agent or absent of them. It is indicated that the pH buffeting effect of them is dominative when the EN solution is lack of the pH buffer. Under this situation, the EN deposition rate increases with the concentration of complexing agents increasing. The EN deposition rate decreases with fin＇ther adding the complexing agent when the solution already has enough pH buffer capability. Electrochemical impedance spectroscopy obtained during EN deposition illustrates that, in this case, the enhanced reaction resistance is the main reason for a lower deposition rate. However, the influence of polarization caused by mass transfer is not negligible at high complex ratio for sodium citrate and malic acid EN solutions.
