This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att...This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.展开更多
The optical properties of monolayer Ge2Sb2Te5 thin films with three different thicknesses prepared by dc magnetron sputtering method at the range of 400-800 nm were studied. The optical absorption coefficients and the...The optical properties of monolayer Ge2Sb2Te5 thin films with three different thicknesses prepared by dc magnetron sputtering method at the range of 400-800 nm were studied. The optical absorption coefficients and the optical energy gap (Eg) were calculated. The results gave values for the absorption coefficients in the range of (1.3-7.5)×105 cm-1 which were in the high absorption wavelength region of 400-800 nm. The optical energy gaps were 0.684, 0.753 and 0.810 eV corresponding the films thicknesses of 57, 88 and 127 nm, respectively, showing the characteristic of increasing with the increase of the film thickness.展开更多
Zinc oxide(ZnO) thin films were deposited onto different substrates — tin-doped indium oxide(ITO)/glass, ITO/polyethylene naphthalate(PEN), ITO/polyethylene terephthalate(PET) — by the radio-frequency(RF) magnetron ...Zinc oxide(ZnO) thin films were deposited onto different substrates — tin-doped indium oxide(ITO)/glass, ITO/polyethylene naphthalate(PEN), ITO/polyethylene terephthalate(PET) — by the radio-frequency(RF) magnetron sputtering method. The effect of various O2/(Ar+O2) gas flow ratios(0, 0.1, 0.2, 0.3, 0.4, 0.5, and 0.6) was studied in detail. ZnO layers deposited onto ITO/PEN and ITO/PET substrates exhibited a stronger c-axis preferred orientation along the(0002) direction compared to ZnO deposited onto ITO/glass. The transmittance spectra of ZnO films showed that the maximum transmittances of ZnO films deposited onto ITO/glass, ITO/PEN, and ITO/PET substrates were 89.2%, 65.0%, and 77.8%, respectively. Scanning electron microscopy(SEM) images of the film surfaces indicated that the grain was uniform. The cross-sectional SEM images showed that the ZnO films were columnar structures whose c-axis was perpendicular to the film surface. The test results for a fabricated ZnO thin film based energy harvester showed that its output voltage increased with increasing acceleration of external vibration.展开更多
Undoped and copper(Cu)doped zinc oxide(Zn_(1-x)Cu_(x)O,where x=0-0.065)nano crystal thin films have been deposited on glass substrate via RF/DC reactive co-sputtering technique.The aim of this work is to investigate t...Undoped and copper(Cu)doped zinc oxide(Zn_(1-x)Cu_(x)O,where x=0-0.065)nano crystal thin films have been deposited on glass substrate via RF/DC reactive co-sputtering technique.The aim of this work is to investigate the crystal structure of ZnO and Cu doped ZnO thin films and also study the effect of Cu doping on optical band gap of ZnO thin films.The identification and confirmation of the crystallinity,film thickness and surface morphology of the nano range thin films are confirmed by using X-ray diffractometer(XRD),scanning electron microscope and atomic force microscope.The XRD peak at a diffractive angle of 34.44°and Miller indices at(002)confirms the ZnO thin films.Crystallite size of undoped ZnO thin films is 27 nm and decreases from 27 nm to 22 nm with increasing the atomic fraction of Cu(x_(Cu))in the ZnO thin films from 0 to 6.5%respectively,which is calculated from XRD(002)peaks.The different bonding information of all deposited films was investigated by Fourier transform infrared spectrometer in the range of wave number between 400 cm^(-1) to 4000 cm^(-1).Optical band gap energy of all deposited thin films was analyzed by ultraviolet visible spectrophotometer,which varies from 3.35 eV to 3.19 eV with the increase of x_(Cu) from 0 to 6.5%respectively.Urbach energy of the deposited thin films increases from 115 meV to 228 meV with the increase of x_(Cu) from 0 to 6.5% respectively.展开更多
The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystalliz...The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystallization behavior of amorphous Ge2Sb2Te5 film was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and differential scanning calorimetry (DSC). With an increase of annealing temperature, the amorphous Ge2Sb2Te5 film undergoes a two-step crystallization process that it first crystallizes in face-centered-cubic (fcc) crystal structure and finally fcc structure changes to hexagonal (hex) structure. Activation energy values of 3.636±0.137 and 1.579±0.005 eV correspond to the crystallization and structural transformation processes, respectively. From annealing temperature dependence of the film resistivity, it is determined that the first steep decrease of the resistivity corresponds to crystallization while the second one is primarily caused by structural transformation from 'fcc' to 'hex' and growth of the crystal grains. Current-voltage (Ⅰ-Ⅴ) characteristics of the device with 40 nm-thick Ge2Sb2Te5 film show that the Ge2Sb2Te5 film with nanometer order thickness is still applicable for memory medium of nonvolatile phase change memory.展开更多
To validate the correctness of the Hartman-Perdok Theory （HPT）, which indicates that the { 111 } planes have the lowest surface energy in spinel ferrites, the {111} plane orientated ZnFe204 thin films on Si（100）,...To validate the correctness of the Hartman-Perdok Theory （HPT）, which indicates that the { 111 } planes have the lowest surface energy in spinel ferrites, the {111} plane orientated ZnFe204 thin films on Si（100）, Si（111）, and SIO2（500 nm）/Si（111） substrates were obtained through a radio frequency （RF） magnetron sputtering method with a low sputtering power of 80 W. All of the experiments prove that the atom energy determined by sputtering power plays an important role in the orientated growth of the ZnFe204 thin films, and it matches well with HPT. The ZnFe2O4 thin films exhibit ferromagnetism with a magnetization of 84.25 ld/mol at room temperature, which is different from the bulk counterpart （antiferromagnetic as usual）. The ZnFe204 thin films can be used as high-quality oriented inducing buffer layers for other spinel （Ni, Mn）Zn ferrite thin films and may have high potential in magnetic thin films-based devices.展开更多
In this work ITO thin film annealing was carried out using a CW CO2 laser beam for ITO thin film annealing over a 1 cm2 area with a temperature higher than 250°C to obtain ITO grains with excellent structural qua...In this work ITO thin film annealing was carried out using a CW CO2 laser beam for ITO thin film annealing over a 1 cm2 area with a temperature higher than 250°C to obtain ITO grains with excellent structural quality thin films. The obtained ITO films were characterized for crystallization, surface morphology, electrical and optical properties, which has theoretical significance and application value. ITO thin films are deposited on glass substrates by sputter coater system (RF) from a high density target (In2O3-SnO2, 90-10 wt%). After deposition, ITO thin films have been irradiated by CW CO2 laser (λ = 10.6 μm) with power ranging from 1 to 10 watt. These films were annealed at temperatures 250°C, 350°C, and 450°C in the air for 20 minutes using different laser power. The main incentive was to develop a low temperature process for ITO thin films, which typically required a 350°C anneal to crystallize and achieve optimum optical and electrical properties. The XRD results showed that 350°C temperature laser annealing could crystallize ITO with a strong (222) preferred orientation and its grain size increased from 29.27 nm to 48.63 nm. The structure, optical transmission, energy gap, resistivity and sheet resistance of the ITO thin films were systematically investigated as a function of laser post annealing temperature. It was found that the lowest resistivity was 2.9 × 10-4 Ω-cm and that sheet resistance was 14.5 Ω/sq. And the highest optical transmittance (98.65%) of ITO films was obtained at 350°C annealing temperature.展开更多
基金financial supports by National Natural Science Foundation of China(Nos.11975163 and 12175160)Nantong Basic Science Research-General Program(No.JC22022034)Natural Science Research Fund of Jiangsu College of Engineering and Technology(No.GYKY/2023/2)。
文摘This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.
文摘The optical properties of monolayer Ge2Sb2Te5 thin films with three different thicknesses prepared by dc magnetron sputtering method at the range of 400-800 nm were studied. The optical absorption coefficients and the optical energy gap (Eg) were calculated. The results gave values for the absorption coefficients in the range of (1.3-7.5)×105 cm-1 which were in the high absorption wavelength region of 400-800 nm. The optical energy gaps were 0.684, 0.753 and 0.810 eV corresponding the films thicknesses of 57, 88 and 127 nm, respectively, showing the characteristic of increasing with the increase of the film thickness.
基金supported by the National Natural Science Foundation of China (61671017)Anhui Provincial Natural Science Foundation (1508085ME72)the Provincial Natural Science Foundation of Anhui Higher Education Institution (KJ2016A787)
文摘Zinc oxide(ZnO) thin films were deposited onto different substrates — tin-doped indium oxide(ITO)/glass, ITO/polyethylene naphthalate(PEN), ITO/polyethylene terephthalate(PET) — by the radio-frequency(RF) magnetron sputtering method. The effect of various O2/(Ar+O2) gas flow ratios(0, 0.1, 0.2, 0.3, 0.4, 0.5, and 0.6) was studied in detail. ZnO layers deposited onto ITO/PEN and ITO/PET substrates exhibited a stronger c-axis preferred orientation along the(0002) direction compared to ZnO deposited onto ITO/glass. The transmittance spectra of ZnO films showed that the maximum transmittances of ZnO films deposited onto ITO/glass, ITO/PEN, and ITO/PET substrates were 89.2%, 65.0%, and 77.8%, respectively. Scanning electron microscopy(SEM) images of the film surfaces indicated that the grain was uniform. The cross-sectional SEM images showed that the ZnO films were columnar structures whose c-axis was perpendicular to the film surface. The test results for a fabricated ZnO thin film based energy harvester showed that its output voltage increased with increasing acceleration of external vibration.
基金Maulana Azad National Fellowship(MANF)Scheme of University Grants Commission,New Delhi,India。
文摘Undoped and copper(Cu)doped zinc oxide(Zn_(1-x)Cu_(x)O,where x=0-0.065)nano crystal thin films have been deposited on glass substrate via RF/DC reactive co-sputtering technique.The aim of this work is to investigate the crystal structure of ZnO and Cu doped ZnO thin films and also study the effect of Cu doping on optical band gap of ZnO thin films.The identification and confirmation of the crystallinity,film thickness and surface morphology of the nano range thin films are confirmed by using X-ray diffractometer(XRD),scanning electron microscope and atomic force microscope.The XRD peak at a diffractive angle of 34.44°and Miller indices at(002)confirms the ZnO thin films.Crystallite size of undoped ZnO thin films is 27 nm and decreases from 27 nm to 22 nm with increasing the atomic fraction of Cu(x_(Cu))in the ZnO thin films from 0 to 6.5%respectively,which is calculated from XRD(002)peaks.The different bonding information of all deposited films was investigated by Fourier transform infrared spectrometer in the range of wave number between 400 cm^(-1) to 4000 cm^(-1).Optical band gap energy of all deposited thin films was analyzed by ultraviolet visible spectrophotometer,which varies from 3.35 eV to 3.19 eV with the increase of x_(Cu) from 0 to 6.5%respectively.Urbach energy of the deposited thin films increases from 115 meV to 228 meV with the increase of x_(Cu) from 0 to 6.5% respectively.
文摘The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystallization behavior of amorphous Ge2Sb2Te5 film was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and differential scanning calorimetry (DSC). With an increase of annealing temperature, the amorphous Ge2Sb2Te5 film undergoes a two-step crystallization process that it first crystallizes in face-centered-cubic (fcc) crystal structure and finally fcc structure changes to hexagonal (hex) structure. Activation energy values of 3.636±0.137 and 1.579±0.005 eV correspond to the crystallization and structural transformation processes, respectively. From annealing temperature dependence of the film resistivity, it is determined that the first steep decrease of the resistivity corresponds to crystallization while the second one is primarily caused by structural transformation from 'fcc' to 'hex' and growth of the crystal grains. Current-voltage (Ⅰ-Ⅴ) characteristics of the device with 40 nm-thick Ge2Sb2Te5 film show that the Ge2Sb2Te5 film with nanometer order thickness is still applicable for memory medium of nonvolatile phase change memory.
基金financially supported by the National Natural Science Foundation of China(No.51101028)the Fundamental Research Funds for the Central Universities of China(No.E022050205)
文摘To validate the correctness of the Hartman-Perdok Theory （HPT）, which indicates that the { 111 } planes have the lowest surface energy in spinel ferrites, the {111} plane orientated ZnFe204 thin films on Si（100）, Si（111）, and SIO2（500 nm）/Si（111） substrates were obtained through a radio frequency （RF） magnetron sputtering method with a low sputtering power of 80 W. All of the experiments prove that the atom energy determined by sputtering power plays an important role in the orientated growth of the ZnFe204 thin films, and it matches well with HPT. The ZnFe2O4 thin films exhibit ferromagnetism with a magnetization of 84.25 ld/mol at room temperature, which is different from the bulk counterpart （antiferromagnetic as usual）. The ZnFe204 thin films can be used as high-quality oriented inducing buffer layers for other spinel （Ni, Mn）Zn ferrite thin films and may have high potential in magnetic thin films-based devices.
文摘In this work ITO thin film annealing was carried out using a CW CO2 laser beam for ITO thin film annealing over a 1 cm2 area with a temperature higher than 250°C to obtain ITO grains with excellent structural quality thin films. The obtained ITO films were characterized for crystallization, surface morphology, electrical and optical properties, which has theoretical significance and application value. ITO thin films are deposited on glass substrates by sputter coater system (RF) from a high density target (In2O3-SnO2, 90-10 wt%). After deposition, ITO thin films have been irradiated by CW CO2 laser (λ = 10.6 μm) with power ranging from 1 to 10 watt. These films were annealed at temperatures 250°C, 350°C, and 450°C in the air for 20 minutes using different laser power. The main incentive was to develop a low temperature process for ITO thin films, which typically required a 350°C anneal to crystallize and achieve optimum optical and electrical properties. The XRD results showed that 350°C temperature laser annealing could crystallize ITO with a strong (222) preferred orientation and its grain size increased from 29.27 nm to 48.63 nm. The structure, optical transmission, energy gap, resistivity and sheet resistance of the ITO thin films were systematically investigated as a function of laser post annealing temperature. It was found that the lowest resistivity was 2.9 × 10-4 Ω-cm and that sheet resistance was 14.5 Ω/sq. And the highest optical transmittance (98.65%) of ITO films was obtained at 350°C annealing temperature.
