Carbon nitride CN. thin films have been deposited on polycrystalline β-Si3N4 substrates by un-balanced magnetron sputtering in a nitrogen discharge. Both the film deposition rate and the nitrogen concentration decrea...Carbon nitride CN. thin films have been deposited on polycrystalline β-Si3N4 substrates by un-balanced magnetron sputtering in a nitrogen discharge. Both the film deposition rate and the nitrogen concentration decrease with substrate temperature increase in the range of 100~400℃The maximum of nitrogen content is 40 at. pct. Raman spectroscopy and atomic force mi-croscopy were used to characterize the bonding, microstructure and surface roughness of the films. Nanoindentation experiments exhibit a higher hardness of 70 GPa and an extremely elas-tic recovery of 85% at higher substrate temperature.展开更多
Carbon nitride thin films were deposited at different substrate temperature(ST)by using reactive magnetron sputtering in a pure N_(2) discharge,and studied by laser Raman spectroscopy,x-ray photoelectron spectroscopy(...Carbon nitride thin films were deposited at different substrate temperature(ST)by using reactive magnetron sputtering in a pure N_(2) discharge,and studied by laser Raman spectroscopy,x-ray photoelectron spectroscopy(XPS),and spectroscopic ellipsometer.The Raman spectra of the films show that I(D)/I(G)decreased with the increase of ST.The D bandposition shifted towards lower frequency,while the G bandposition shifted towards higher frequency as the ST increased.The XPS data exhibit that Nls binding states also depend on ST.The optical band gap of the films is found dropped from 0.22eV to 0.10eV with the increase of ST.展开更多
文摘Carbon nitride CN. thin films have been deposited on polycrystalline β-Si3N4 substrates by un-balanced magnetron sputtering in a nitrogen discharge. Both the film deposition rate and the nitrogen concentration decrease with substrate temperature increase in the range of 100~400℃The maximum of nitrogen content is 40 at. pct. Raman spectroscopy and atomic force mi-croscopy were used to characterize the bonding, microstructure and surface roughness of the films. Nanoindentation experiments exhibit a higher hardness of 70 GPa and an extremely elas-tic recovery of 85% at higher substrate temperature.
文摘Carbon nitride thin films were deposited at different substrate temperature(ST)by using reactive magnetron sputtering in a pure N_(2) discharge,and studied by laser Raman spectroscopy,x-ray photoelectron spectroscopy(XPS),and spectroscopic ellipsometer.The Raman spectra of the films show that I(D)/I(G)decreased with the increase of ST.The D bandposition shifted towards lower frequency,while the G bandposition shifted towards higher frequency as the ST increased.The XPS data exhibit that Nls binding states also depend on ST.The optical band gap of the films is found dropped from 0.22eV to 0.10eV with the increase of ST.
