The Ga_(2)O_(3) films are deposited on the Si and quartz substrates by magnetron sputtering, and annealing. The effects of preparation parameters(such as argon–oxygen flow ratio, sputtering power, sputtering time and...The Ga_(2)O_(3) films are deposited on the Si and quartz substrates by magnetron sputtering, and annealing. The effects of preparation parameters(such as argon–oxygen flow ratio, sputtering power, sputtering time and annealing temperature)on the growth and properties(e.g., surface morphology, crystal structure, optical and electrical properties of the films) are studied by x-ray diffractometer(XRD), scanning electron microscope(SEM), and ultraviolet-visible spectrophotometer(UV-Vis). The results show that the thickness, crystallization quality and surface roughness of the β-Ga_(2)O_(3) film are influenced by those parameters. All β-Ga_(2)O_(3) films show good optical properties. Moreover, the value of bandgap increases with the enlarge of the percentage of oxygen increasing, and decreases with the increase of sputtering power and annealing temperature, indicating that the bandgap is related to the quality of the film and affected by the number of oxygen vacancy defects. The I–V curves show that the Ohmic behavior between metal and β-Ga_(2)O_(3) films is obtained at 900℃. Those results will be helpful for the further research of β-Ga_(2)O_(3) photoelectric semiconductor.展开更多
以硝酸锌为原料,乌洛托品为催化剂,采用水热法分别在自支撑金刚石膜及硅基底上制备了ZnO纳米棒。采用场发射扫描电子显微镜、X射线衍射、拉曼光谱、PL谱、场发射测试表征了ZnO纳米棒/硅及ZnO纳米棒/自支撑金刚石膜的形貌、尺寸及场发射...以硝酸锌为原料,乌洛托品为催化剂,采用水热法分别在自支撑金刚石膜及硅基底上制备了ZnO纳米棒。采用场发射扫描电子显微镜、X射线衍射、拉曼光谱、PL谱、场发射测试表征了ZnO纳米棒/硅及ZnO纳米棒/自支撑金刚石膜的形貌、尺寸及场发射性能。结果表明,在两种基底上制备的ZnO纳米棒均沿c轴方向生长,其中在自支撑金刚石膜上制备的ZnO纳米棒出现了尖端现象,并且具有更好的结晶度、纯度与更少的结构缺陷,其开启电场为6.8 V/μm,在11.9 V/μm的电场下,发射电流密度为0.20 m A/cm^2,场增强因子比在Si基底上制备的ZnO纳米棒的场发射性能高11.5倍。展开更多
基金Project supported by the Science and Technology Major Project of Shanxi Province,China (Grant No.20181102013)the “1331 Project” Engineering Research Center of Shanxi Province,China (Grant No.PT201801)the Natural Science Foundation of Shanxi Province,China (Grant No.201801D221131)。
文摘The Ga_(2)O_(3) films are deposited on the Si and quartz substrates by magnetron sputtering, and annealing. The effects of preparation parameters(such as argon–oxygen flow ratio, sputtering power, sputtering time and annealing temperature)on the growth and properties(e.g., surface morphology, crystal structure, optical and electrical properties of the films) are studied by x-ray diffractometer(XRD), scanning electron microscope(SEM), and ultraviolet-visible spectrophotometer(UV-Vis). The results show that the thickness, crystallization quality and surface roughness of the β-Ga_(2)O_(3) film are influenced by those parameters. All β-Ga_(2)O_(3) films show good optical properties. Moreover, the value of bandgap increases with the enlarge of the percentage of oxygen increasing, and decreases with the increase of sputtering power and annealing temperature, indicating that the bandgap is related to the quality of the film and affected by the number of oxygen vacancy defects. The I–V curves show that the Ohmic behavior between metal and β-Ga_(2)O_(3) films is obtained at 900℃. Those results will be helpful for the further research of β-Ga_(2)O_(3) photoelectric semiconductor.
文摘以硝酸锌为原料,乌洛托品为催化剂,采用水热法分别在自支撑金刚石膜及硅基底上制备了ZnO纳米棒。采用场发射扫描电子显微镜、X射线衍射、拉曼光谱、PL谱、场发射测试表征了ZnO纳米棒/硅及ZnO纳米棒/自支撑金刚石膜的形貌、尺寸及场发射性能。结果表明,在两种基底上制备的ZnO纳米棒均沿c轴方向生长,其中在自支撑金刚石膜上制备的ZnO纳米棒出现了尖端现象,并且具有更好的结晶度、纯度与更少的结构缺陷,其开启电场为6.8 V/μm,在11.9 V/μm的电场下,发射电流密度为0.20 m A/cm^2,场增强因子比在Si基底上制备的ZnO纳米棒的场发射性能高11.5倍。
