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Automated Calibration of RF On-Wafer Probing and Evaluation of Probe Misalignment Effects Using a Desktop Micro-Factory

Automated Calibration of RF On-Wafer Probing and Evaluation of Probe Misalignment Effects Using a Desktop Micro-Factory
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摘要 A fully automatic setup for on-wafer contact probing will be presented. This setup consists of six automatable nano positioning axes used as tool holder and a sample holder. With this setup a fully automatic one-port SOL calibration for a Vector Network Analyzer is done. Furthermore a fully automated on-wafer contact probing is performed. Afterwards, the effects of a misalignment of the three tips of a GSG-probe are examined. Additionally the error on the calibration is calculated to determine its effect on the measurement. The results show, that a misalignment of the probe has a high impact on the measurement of the VNA. Hence a fully automated on-wafer probing presented in this paper is a good way to detect these misalignments and correct them if necessary. A fully automatic setup for on-wafer contact probing will be presented. This setup consists of six automatable nano positioning axes used as tool holder and a sample holder. With this setup a fully automatic one-port SOL calibration for a Vector Network Analyzer is done. Furthermore a fully automated on-wafer contact probing is performed. Afterwards, the effects of a misalignment of the three tips of a GSG-probe are examined. Additionally the error on the calibration is calculated to determine its effect on the measurement. The results show, that a misalignment of the probe has a high impact on the measurement of the VNA. Hence a fully automated on-wafer probing presented in this paper is a good way to detect these misalignments and correct them if necessary.
作者 F. T. von Kleist-Retzow T. Tiemerding P. Elfert O. C. Haenssler F. T. von Kleist-Retzow;T. Tiemerding;P. Elfert;O. C. Haenssler(Division Microrobotics and Control Engineering, University Oldenburg, Oldenburg, Germany;Group Automated Nanohandling, OFFIS, Institute for Information Technology, Oldenburg, Germany;Institutd’Electronique, de Microélectroniqueet de Nanotechnologie, CNRS/University of Lille, Lille, France)
出处 《Journal of Computer and Communications》 2016年第3期61-67,共7页 电脑和通信(英文)
关键词 CALIBRATION On-Wafer Measurements MISALIGNMENT Automation High Frequency (HF) Probe Ground-Signal-Ground (GSG) Probe Calibration On-Wafer Measurements Misalignment Automation High Frequency (HF) Probe Ground-Signal-Ground (GSG) Probe
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