摘要
Forming and nanostructuring processes of TiN film by electric arc evaporation under the conditions of the reactive nitrogen gas deficit in the gas mixture (30%) have been investigated. The results of a technological experiment, electron microscopic examination, X-ray diffraction phase analysis and mechanical testing of the film revealed that a significant increase in ion density and mobility leads to deterioration of the formation temperature conditions, structural and phase changes in TiN film and change of the main cubic phase (111)TiN on a hexagonal (101)TiN0.3. In the end repeated decrease of the the film microhardness with (101)TiN0.3 was caused not only by erosion of the film, but also because of change in the processes of its formation and nanostructuring in comparison with similar processes of the film with (111)TiN.
Forming and nanostructuring processes of TiN film by electric arc evaporation under the conditions of the reactive nitrogen gas deficit in the gas mixture (30%) have been investigated. The results of a technological experiment, electron microscopic examination, X-ray diffraction phase analysis and mechanical testing of the film revealed that a significant increase in ion density and mobility leads to deterioration of the formation temperature conditions, structural and phase changes in TiN film and change of the main cubic phase (111)TiN on a hexagonal (101)TiN0.3. In the end repeated decrease of the the film microhardness with (101)TiN0.3 was caused not only by erosion of the film, but also because of change in the processes of its formation and nanostructuring in comparison with similar processes of the film with (111)TiN.
