期刊文献+

液晶投影显示复眼照明的容差模拟分析 被引量:11

Tolerance Analysis for Fly′s eye Illumination System of LCLV Projector
下载PDF
导出
摘要 介绍了液晶投影显示复眼照明的工作原理 ,采用扩展 4× 4矩阵模型描述了复眼照明 ,以能量利用率和照明均匀性作为系统的评价标准 ,对复眼透镜的制造误差和位置误差进行计算机模拟分析 ,分析表明 ,双排复眼透镜相对位置误差对系统性能影响大于加工误差 ,而第一排复眼透镜的加工误差对能量利用率的影响大于第二排复眼透镜 。 Fly′s eye illumination system provided high optical efficiency and super uniformity for large area illumination, especially for LCLV Projector. In this paper, 4×4 extended matrix model was introduced for system, and optical efficiency and uniformity of illumination system were analyzed by extended matrix and optical eikon. Simulation software was constructed under extended matrix model, and different tolerance of manufacture error and position error of fly′s eye illumination system was analyzed. By simulation, position error of fly′s eye has stronger influence in system performance than that of manufacture error, and the manufacture error of the first fly′s eye has stronger influence in the optical efficiency of the system, the manufacture of the second fly′s eye has stronger influence in the uniformity of illumination system.
作者 郑臻荣
出处 《光子学报》 EI CAS CSCD 北大核心 2004年第5期593-597,共5页 Acta Photonica Sinica
基金 国防预研项目 (6 6 5 1 )支持
关键词 复眼照明系统 扩展4×4矩阵 容差分析 Fly′s eye illumination Extended matrix model Tolerance analysis
  • 相关文献

参考文献14

  • 1Shikama S,Toide E,Knodo M.A Polarization-transforming optics for a high-luminance LCD projection.Proceeding of the S I D,1991,32(4):301-304 被引量:1
  • 2Jacobson B A, Gerglbach R D, Ferri J M.Beam shape transforming device in high-efficiency projection System.Proc of SPIE, 1997,3139:141-150 被引量:1
  • 3Bowron J,Baker J,Schmidt T.New high-brightness compact LCD projector. SPIE, 1996,2650:217-224 被引量:1
  • 4Li H F,Zheng Z R,et al. Improved projection optics for reflective silicon CMOS light valves. SPIE,1999,3624:18-22 被引量:1
  • 5Toshiaki H, Tomiytoshi U,Hisashi I.Polarizing illumination device and projection display device. U S Patent 6,092,901,2000 被引量:1
  • 6Ryusaku T, Tafsuru K. Image projector and illumination device used for the image projector. U S Patent 6,046,856,2000 被引量:1
  • 7Atsushi S, Hideaki S. Polarization device and projection type display apparatus. U S Patent 6,067,193, 2000 被引量:1
  • 8Deng Ximing, Xiang ChunLiang, Shen Ze Zun.Uniform illumination of large targets using a lens array.Applied Optics, 1986,25(3):337-381 被引量:1
  • 9Glaser I.Applications of the lenslet array processor. SPIE, 1983,564:180-185 被引量:1
  • 10Wang S M.Matrix method in treating decent optical systems. Opt & Quantum Electron,1985,117(1):136-138 被引量:1

共引文献24

同被引文献98

引证文献11

二级引证文献86

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部