摘要
利用电子束离子源 (EBIS)或者电子束离子陷阱 (EBIT)产生的慢速高电荷态重离子束轰击金属靶面 ,离子束与靶面作用并复合辐射特征 X射线 ;并将高荷态离子束采用离子光学系统会聚为微细束后再与靶面作用 ,能够辐射出微米甚至亚微米级、纳米级的微束斑 X射线。本文介绍这一新型微束斑 X射线源的结构、机理及其特性等。
The electron beam ion trap(EBIT) and the electron ion source(EBIS) are new instruments for the study of X-ray produced by very highly-charged ions when they interact with free electrons. Some of the design and physics features of EBIT/EBIS are described, and the characters of the X-ray produced with them are described too. Micro-focal X-ray can be taken out if focusing the ion beam with the ion-optical system.
出处
《应用光学》
CAS
CSCD
2004年第1期5-8,38,共5页
Journal of Applied Optics
基金
国家自然科学基金资助项目 (6 98780 33)
