摘要
低温沉积薄膜技术在制作先进的微电子学器件和集成多功能传感器方面非常重要。最近,应用微波电子回旋共振(ECR)等离子体溅射法沉积成高性能、高沉积速率和低基片温度的ZnO薄膜。本文叙述应用微波ECR等离子体溅射法沉积ZnO膜的制法及其性能。
The low-temperature deposition technique for thin films is of great importance in fabrication of advanced microelectronic devices and integrated multi-spneor chip. Recently,the microwave electron-cyclotron-resonance(ECR) plasma sputtering method has been employed to deposite ZnO thin film, which possesses some advantages of high performance, high depositing rate and low substrate temperature. This paper reviewed the preparation and properties of ZnO thin films using ECR plasma sputtering method.
出处
《压电与声光》
CSCD
北大核心
1992年第2期41-46,共6页
Piezoelectrics & Acoustooptics
关键词
ZNO薄膜
等离子体溅射
沉积
制备
ZnO thin film, ECR plasma, microwave plasma sputtering
